IFF
Scientific Report 2000/2001


Institute for Microstructure Research

General Overview

The Institut für Mikrostrukturforschung (Institute for Microstructure Research) is working in a number of fields. These were selected with an emphasis on modern-materials aspects, the importance of an atomistic and microstructural understanding for materials performance and the possibility to contribute to the development of technology. In some of these fields the competence spans the whole range from materials preparation via basic physics investigations to technical devices. In others access to interesting materials and device problems is provided by qualified collaborations. Besides this general-physics and technology part of the institute there is a second part of special competence. This is structure research by means of modern transmission electron microscopy and scanning tunnelling microscopy. This work is carried out within the Jülich Centre for High-Resolution Electron Microscopy. It is operated by the institute and serves a wider community of users.

Research Fields

  1. Ceramic Superconductors: Here the emphasis is on thin-film and heterostructure production, Josephson effects, and their application in magnetometer systems and spectroscopic techniques.
  2. Semiconductors: Here the emphasis is on structural investigations, mainly by transmission electron microscopy, of thin films and heterostructures. In collaboration with various research groups we are studying growth-related problems, like the relaxation mechanisms in SiGe films or the influence of doping on the microstructure in as-grown and annealed low-temperature grown GaAs films. Device relevant topics are addressed by studies on the interdiffusion in III-V heterostructures and by investigations of the microstructure of thin film solar cells of microcrystalline silicon. Another topic is the study of electronic states in compound semiconductors by scanning tunnelling microscopy employing a technique pioneered in our group. It permits, via the detection of the far-reaching Debye screening cloud at the surface, an investigation of charged doping or impurity atoms in the bulk of the samples.
  3. Metallic Alloys: These are at present quasicrystalline alloys and related normalcrystalline approximants. We are growing large single-quasicrystals for our own research but also for users world-wide, in particular for the participants in the DFG priority program on quasicrystals. Our own work on quasicrystals and approximants concentrates on phase-diagrams, plasticity and surface physics.
  4. Electroceramics: In the field of electroceramic materials we take advantage of our long-standing experience with respect to perovscitic materials both in preparation and in transmission electron microscopy. In collaboration with the Institut für Electrokeramische Materialien (Prof. Waser) we dedicate a large research capacity to the investigation of the structural aspects of the production and properties of electroceramic thin films.
  5. High-Resolution Electron Microscopy: The theoretical and technical aspects of atomic-resolution transmission electron microscopy have in recent years become one of the central fields of interest of our group. Computer program packages for the exit wave-function reconstruction developed in the institute are in use world-wide. In collaboration with EMBL Heidelberg and TU Darmstadt we developed the word's first aberration-corrected transmission electron microscope with record resolution, 1.3 Å at 200 kV. These developments are continued (see below).

Equipment

The institute has at its disposal sputtering deposition machines, some of them with three-target facilities, which were developed and built in the institute for the high-quality deposition of ceramic superconductor thin films and heterostructures. For device production local clean room, structuring and packaging facilities are available. The institute operates the Jülich Centre for High-Resolution Electron Microscopy with two 400 kV JEOL machines of the type 4000 EX/FX, a JEOL 2000 EX, a PHILIPS CM20 FEG, the spherical-aberration corrected PHILIPS CM200 FEG and a JEOL 840A scanning microscope. The priority in scanning tunnelling microscopy is on high-temperature investigations a field only rarely served by other competing groups. We have at our disposal two microscopes with in-situ cleaving facilities and ex-situ heating up to 750 °C. These instruments were designed and built inside the institute. An in-situ heating STM (Omicron) is used since early 2000. For the work on alloy plasticity a Zwick mechanical testing system has been installed in 1998. The collaboration with the Max-Planck-Institut für Mikrostrukturphysik at Halle in this field is continued. The institute operates together with the Institut für Streumethoden (Prof. Brückel) the IFF laboratory for crystal-growth.

Special results and developments

The institute was very successful in recent years in application of high-temperature superconductivity to communication systems. In particular the multipole dielectric filters designed in the institute received considerable attention world-wide. In 1998, as partner of BOSCH, we won the competition for a project "High-Temperature Superconductivity for the Communication Technology of the Future" which became one of the five priority programs of the German Federal Minister of Science and Technology. During the year 1999, in the course of a reorganisation of our institute, the whole high-frequency research group was transferred to the Institut für Schicht- und Ionentechnik (ISI). The free capacity, both with respect to personnel and funds, offered to us an excellent opportunity for development of new research competence.

Due to our unique position in this field we chose to direct our resources towards the development of Hilbert-transform spectroscopy on the basis of the ac-Josephson effect. This technique provides an excellent and novel tool for spectroscopy in the frequency range of 1010 to 1013 Hertz. It is broad band and orders of magnitude faster than Fourier spectroscopy. Here we have an excellent collaboration with the Institute for Radioelectronics (IRE) in Moscow. We succeeded in acquiring a BMBF-project for the development of a fast gas-spectrometer and a project with DESY, Hamburg. The latter is a consequence of our successful test of Hilbert-transform spectroscopy for the determination of the shape of electron bunches in the beam of the TESLA test facility in Hamburg. The goals are: Improving the sensitivity of the technique by development of even better Josephson junctions and constructing facilities for fast molecule spectroscopy in our own group.

Our dc-SQUIDs on the basis of ramp-type junction geometry continue their success both in performance and in their acceptance on the market. As a supplier of TRISTAN Company (USA, formerly Conductus) we deliver a larger number of SQUIDs and magnetometers per month. The market demands represent challenges to science and technology, and our work in this field will be continued as long as we can derive good science from these. The strategy for further developments in superconductivity will be to use our expertise in front technology in this field to develop applications which can also be used for our own research. Hilbert-transform spectroscopy has already been mentioned. SQUID-microscopy is another field. This project has been intensively followed since 1999 in a collaboration (joint patents) with ZEL (Prof. Halling) with the aim to built a SQUID-microscope prototype. Current delays are due to loss in personell and difficulties with suppliers. First tests are expected during 2001. An industry company has been found which is interested in marketing the new instrument.

The successful project of the spherical-aberration corrected transmission electron microscope described above has triggered new activities in electron optics world wide. The novel technology is considered a quantum jump of great commercial impact. New generations of instruments are under construction or in the planning phase in Europe, Japan and the US. Together with other institutions, in particular the Max-Planck-Institut für Metallforschung, we have contributed to the installation of a priority program of the DFG. In the framework of this program 3.8 Mio DM were granted in 1998 to our institute for the development, in collaboration with CEOS Company, Heidelberg, and ZEISS-LEO, Oberkochen, of the world's first Subangström-Instrument. Besides ultra-high resolution the 200 kV machine will contain a monochromator and an in-column energy filter of the Krahl-type. This will maintain the institute's position as a pioneer in advanced instrument development. The institute is partner of PHILIPS Electron Optics with respect to theory and application of exit-wave function reconstruction in high-resolution electron microscopy. Also in this field our institute is respected as an international leader. Recent developments, in particular in computer-controlled alignment, will be subject of further industry collaboration.

The quasicrystal group has currently three DFG funded projects and has submitted proposals for another four in the last phase of the DFG priority program. Great efforts went into new PhD programs with the Russian Academy of Sciences and other GUS state universities and universities in China. In the framework of this special program designed by the institute and the partners abroad the PhD students are working two to three years in Jülich on a grant supervised by the Jülich Doktorandenausschuß, but they will pass their examina in their home university.

Outstanding results of the year 2000:

Prof. Dr. Knut Urban


Institute for Microstructure Research

Personnel 2000/2001 and areas of activity

Scientific Staff

   
     

Dr. Y. Divin

Hilbert-spectroscopy

(23.42.0)

Dr. Ph. Ebert

Scanning tunneling microscopy of semiconductors and quasicrystals

(23.55.0, 23.42.0)

Dr. M. Faley

High-Tc-Superconductor SQUIDs, Multilayer structures, SQUID-Microscopy

(23.42.0)

Dr. M. Feuerbacher

Plasticity of quasicrystals

(23.55.0)

Dr. B. Grushko

Crystal growth, phase diagrams of alloys

(23.55.0)

Dr. C.L. Jia

Characterization of superconductors, diamond and electroceramic films by high-resolution electron microsopy

(23.42.0)

Dr. M. Lentzen

Reconstruction techniques in high-resolution electron microscopy, Cs-corrected transmission electron microscopy for imaging of interfaces in semiconductors and of superconducting materials

(23.42.0, 23.55.0)

Dr. M. Luysberg

Transmission electron microscopy of semiconductor heterostructures, low-temperature GaAs and microcrystalline silicon

(23.42.0)

Dr. U. Poppe

Superconductivity, tunneling spectroscopy, High-Tc superconductor thin films and multilayers, SQUID-Microscopy

(23.42.0)

Dr. A. Thust

Reconstruction techniques in high-resolution electron microscopy, Cs-corrected transmission electron microscopy for imaging of interfaces in semiconductors, electron microscopy of superconducting materials

(23.42.0, 23.55.0)

Prof. Dr. K. Urban

Head of Institute

(23.42.0, 23.55.0)

     
     

Technical Staff

   
     

M. Beyss

Crystal growth, Materials preparation and characterization

(23.55.0)

DI W. Evers

Physical experimental technique, low temperature technique, thin film production

(23.55.0, 23.42.0)

A. Fattah

Crystal growth, Materials preparation and characterization

(23.55.0)

K. Fischer

Crystal growth, Materials preparation and characterization

(23.55.0)

R. Fischer

Metallography, Materials preparation and characterization

(23.55.0)

DI K.-H. Graf

Electronics, Electronic data processing, scanning tunneling microscopy

(23.55.0, 23.42.0)

D. Meertens

Metallography, semiconductor preparation, scanning- and transmission electron microscopy

(23.55.0, 23.42.0)

W. Pieper

Technical supervisor, Centre for High Resolution Electron Microscopy

(23.55.0, 32.42.0)

I. Rische-Radloff

Secretary

 

K. Schwill

Trainee

 

R. Speen

SQUID-Microscopy, Sputtering systems

 

C. Thomas

Crystal growth, Materials preparation and characterization

(23.55.0)

G. Waßenhoven

Photolaboratory, photography technique

(23.55.0, 23.42.0)

E. Würtz

Metallography, semiconductor preparation, scanning and transmission electron microscopy

(23.55.0, 23.42.0)

     

Junior scientists

   
     

Dr. Y. Qin

Cs-corrected transmission electron microscopy of electroceramic thin films

(23.42.0)

Dr. L. Houben

Structure characterization of microcrystalline silicon thin films and solar cells. Investigation of potential distributions at grain boundaries in semiconductors and semiconductor devices by holographic imaging.

(23.42.0)

Dr. K. Tillmann

Quantitative analysis of semiconductor heterostructures by high-resolution transmission electron microscopy and finite element simulations

(23.42.0)

     

Doctor students

   
     

V. Chirotov

Broadband Hilbert-Transform Spectroscopy with high-Tc Josephson junctions

(23.42.0)

M. Heggen

Plasticity of quasicrystals and complex intermetallic phases

(23.55.0)

B. Jahnen

Interdiffusion in antimonide-based heterostructures

(23.42.0)

H.Z. Jin

Investigation of electroceramic thin films by high resolution electron microscopy

(23.42.0)

P. Schall

Plasticity of quasicrystals and related intermetallic phases

(23.55.0)

F. Kluge

Scanning tunneling microscopy of quasicrystals

(23.55.0)

S. Mi

Formation of intermetallic and quasicrystalline phases in ternary alloys of aluminium with transition metals

(23.55.0)

U. Semmler

Diffusion and dynamic effects on compound semiconductor surfaces

(23.42.0)

J. Wang

The nature of plasticity in quasicrystalline alloys and related approximants

(23.42.0)

M. Winter

Microwave frequency standards

(23.42.0)

M. Yurechko

Formation of intermetallic phases in ternary alloys of aluminium with transition metals

(23.55.0)

     
     

Diploma students

   
     

D. Kirch

He-Implantation into SiGe/Si Heterostructures

(23.42.0)

Th. Lange

Microstructural investigations of icosahedral Zn-Mg-RE quasicrystals

(23.42.0)

C. Scholten

Influence of the microstructure of microcrystalline silicon solar cells on their optoelectronic properties

(23.42.0)

     
     

Guests

   
     

P. Shadrin

AFM and LSM of high Tc Josephson junctions

 

Dr. M. Vijayalakshmi

Irradiation-induced phase transformations in quasicrystals

(23.55.0)

Dr. J. Wu

Electronmicroscopy and production of oxide films

(23.42.0)

Prof. Dr. R. Wang

Quasicrystalline alloys

(23.55.0)

Prof. Dr. J. Gui

Ferroelectrics

(23.42.0)

Prof. Ohnuki

Irradiated metallic heterostructures

(23.55.0)