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@ARTICLE{Wirths:139334,
author = {Wirths, S. and Ikonic, Z. and Tiedemann, Andreas and
Holländer, B. and Stoica, T. and Mussler, G. and Breuer, U.
and Hartmann, J. M. and Benedetti, A. and Chiussi, S. and
Grützmacher, D. and Mantl, S. and Buca, D.},
title = {{T}ensely strained {G}e{S}n alloys as optical gain media},
journal = {Applied physics letters},
volume = {103},
number = {19},
issn = {0003-6951},
address = {Melville, NY},
publisher = {American Institute of Physics},
reportid = {FZJ-2013-05331},
pages = {192110 -},
year = {2013},
abstract = {This letter presents the epitaxial growth and
characterization of a heterostructure for an electrically
injected laser, based on a strained GeSn active well. The
elastic strain within the GeSn well can be tuned from
compressive to tensile by high quality large Sn content
(Si)GeSn buffers. The optimum combination of tensile strain
and Sn alloying softens the requirements upon indirect to
direct bandgap transition. We theoretically discuss the
strain-doping relation for maximum net gain in the GeSn
active layer. Employing tensile strain of $0.5\%$ enables
reasonable high optical gain values for Ge 0.94Sn0.06 and
even without any n-type doping for Ge 0.92Sn0.08.},
cin = {PGI-9 / ZEA-3},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106 / I:(DE-Juel1)ZEA-3-20090406},
pnm = {421 - Frontiers of charge based Electronics (POF2-421)},
pid = {G:(DE-HGF)POF2-421},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000327817000040},
doi = {10.1063/1.4829360},
url = {https://juser.fz-juelich.de/record/139334},
}