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@INPROCEEDINGS{Hapke:139399,
      author       = {Hapke, P and Carius, R and Finger, F and Lambertz, A and
                      Vetterl, O and Wagner, H},
      title        = {{P}reparation of microcrystalline silicon with the
                      layer-by-layer technique at various plasma excitation
                      frequencies},
      journal      = {MRS online proceedings library},
      issn         = {1946-4274},
      address      = {Warrendale, Pa.},
      publisher    = {MRS},
      reportid     = {FZJ-2013-05395},
      pages        = {737 - 742},
      year         = {1996},
      month         = {Apr},
      date          = {2013-04-16},
      organization  = {MRS, San Fran (USA), 16 Apr 2013 - 5
                       Nov 2013},
      cin          = {IEK-5},
      ddc          = {670},
      cid          = {I:(DE-Juel1)IEK-5-20101013},
      pnm          = {111 - Thin Film Photovoltaics (POF2-111)},
      pid          = {G:(DE-HGF)POF2-111},
      typ          = {PUB:(DE-HGF)8 / PUB:(DE-HGF)16},
      url          = {https://juser.fz-juelich.de/record/139399},
}