Strain engineered Ge based materials for optoelectronics

Buca, Dan Mihai; Mussler, G.; Chiussi, S.; Ikonic,; Wirths, S.; Mantl, S.; Grützmacher, D.; Hartmann, J. M.

Talk (non-conference) (Invited)

FZJ-2013-06505

Strain engineered Ge based materials for optoelectronics

Buca, D. M. (Corresponding author)FZJ* ; Wirths, S.FZJ* ; Ikonic, ; Mussler, G.FZJ* ; Chiussi, S. ; Hartmann, J. M. ; Grützmacher, D.FZJ* ; Mantl, S.FZJ*

2013

Atomically Controlled Processing for Ultralarge Scale Integration - Japan Society for the Promotion of Science (JSPS) , Core-to-Core Program, JSPS: C2C, Frankfurt Oder, Germany, 24 Oct 2013 - 25 Oct 2013

Contributing Institute(s):

Halbleiter-Nanoelektronik (PGI-9)

Research Program(s):

421 - Frontiers of charge based Electronics (POF2-421) (POF2-421)

Appears in the scientific report 2013

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The record appears in these collections:
Document types > Presentations > Talks (non-conference)
Institute Collections > PGI > PGI-9
Workflow collections > Public records
Publications database

Record created 2013-12-16, last modified 2021-01-29

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