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024 7 _ |a 10.1016/j.nimb.2012.11.079
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024 7 _ |a 1872-9584
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037 _ _ |a FZJ-2014-00594
041 _ _ |a English
082 _ _ |a 530
100 1 _ |a Mackova, A.
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245 _ _ |a A study of the structural properties of GaN implanted by various rare-earth ions
260 _ _ |a Amsterdam [u.a.]
|c 2013
|b Elsevier
336 7 _ |a Journal Article
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520 _ _ |a GaN layers with h0001i crystallographic orientation, grown by low-pressure metal-organic vapourphase epitaxy (MOVPE) on c-plane sapphire substrates, were implanted with 200 and 400 keV Sm+, Tm+, Eu+, Tb+ and Ho+ ions at fluencies of 1 1015–1 1016 cm2. The composition of the ion-implanted layers and concentration profiles of the implanted atoms were studied by Rutherford Back-Scattering spectrometry (RBS). The profiles were compared to SRIM 2008 simulations. The structural properties of the ion-implanted layers were characterised by RBS-channelling and Raman spectroscopy. Changes in the surface morphology caused by the ion implantation were examined by Atomic Force Microscopy (AFM). A structural analysis showed a high disorder of the atoms close to the amorphised structure at the surface layer above an implantation fluence of 5 1015 cm2 while lower disorder density was observed in the bulk according to the projected range of 400 keV ions. The post-implantation annealing induced significant changes only in the Sm and Eu depth profiles; a diffusion of rare-earths implanted at a fluence of 5 1015 cm2 to the surface was observed. The annealing caused the reconstruction of the surface layer accompanied by surface-roughness enhancement.
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700 1 _ |a Malinský, P.
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700 1 _ |a Sofer, Z.
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700 1 _ |a Šimek, P.
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700 1 _ |a Sedmidubský, D.
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700 1 _ |a Mikulics, Martin
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700 1 _ |a Wilhelm, R. A.
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773 _ _ |a 10.1016/j.nimb.2012.11.079
|g Vol. 307, p. 446 - 451
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|t Nuclear instruments & methods in physics research / B
|v 307
|y 2013
|x 0168-583X
856 4 _ |u http://www.sciencedirect.com/science/article/pii/S0168583X13000955
856 4 _ |u https://juser.fz-juelich.de/record/150540/files/FZJ-2014-00594.pdf
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909 C O |o oai:juser.fz-juelich.de:150540
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910 1 _ |a Forschungszentrum Jülich GmbH
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914 1 _ |y 2013
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