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@ARTICLE{Mairoser:15164,
author = {Mairoser, T. and Schmehl, A. and Melville, A. and Heeg, T.
and Zander, W. and Schubert, J. and Shai, D. and Monkman,
E.J. and Shen, K.M. and Regier, T.Z. and Schlom, D.G. and
Mannhart, J.},
title = {{I}nfluence of the substrate temperature on the {C}urie
temperature and charge carrier density of epitaxial
{G}d-doped {E}u{O} films},
journal = {Applied physics letters},
volume = {98},
issn = {0003-6951},
address = {Melville, NY},
publisher = {American Institute of Physics},
reportid = {PreJuSER-15164},
pages = {102110},
year = {2011},
note = {We are grateful to Charles Brooks for performing some of
the XRD measurements. E. J. M. acknowledges NSERC for their
support. This work was supported by the DFG (Grant No. TRR
80), the EC (oxIDes), AFOSR (Grant No. FA9550-10-1-0123),
and the NSF (Grant No. DMR-0820404).},
abstract = {Rare earth doping is a standard, yet experimentally poorly
understood method to increase the Curie temperature (T-C) of
the ferromagnetic semiconductor EuO. Here, we report on the
charge carrier density (n) and the T-C of commonly used 4.2
at. $\%$ Gd-doped EuO films grown by molecular-beam epitaxy
on (110) oriented YAlO3 substrates at various substrate
temperatures (T-sub). Increasing T-sub leads to a decrease
in n and T-C. For high substrate temperatures the Gd-doping
is rendered completely inactive: n and T-C drop to the
values of undoped EuO. (C) 2011 American Institute of
Physics. [doi:10.1063/1.3563708]},
keywords = {J (WoSType)},
cin = {JARA-FIT / PGI-9},
ddc = {530},
cid = {$I:(DE-82)080009_20140620$ / I:(DE-Juel1)PGI-9-20110106},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
shelfmark = {Physics, Applied},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000288277200036},
doi = {10.1063/1.3563708},
url = {https://juser.fz-juelich.de/record/15164},
}