000152036 001__ 152036
000152036 005__ 20240610121006.0
000152036 0247_ $$2doi$$a10.1063/1.4851015
000152036 0247_ $$2WOS$$aWOS:000329173200011
000152036 0247_ $$2Handle$$a2128/16800
000152036 037__ $$aFZJ-2014-01856
000152036 041__ $$aEnglish
000152036 082__ $$a530
000152036 1001_ $$0P:(DE-Juel1)144926$$aKovacs, Andras$$b0$$eCorresponding Author$$ufzj
000152036 245__ $$aDefects in paramagnetic Co-doped ZnO films studied by Transmission electron microscopy
000152036 260__ $$aMelville, NY$$bAmerican Institute of Physics$$c2013
000152036 3367_ $$2DRIVER$$aarticle
000152036 3367_ $$2DataCite$$aOutput Types/Journal article
000152036 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1396417289_14486
000152036 3367_ $$2BibTeX$$aARTICLE
000152036 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000152036 3367_ $$00$$2EndNote$$aJournal Article
000152036 520__ $$aWe study planar defects in epitaxial Co:ZnO dilute magnetic semiconductor thin films deposited on c-plane sapphire (Al2O3), as well as the Co:ZnO/Al2O3 interface, using aberration-corrected transmission electron microscopy and electron energy-loss spectroscopy. Co:ZnO samples that were deposited using pulsed laser deposition and reactive magnetron sputtering are both found to contain extrinsic stacking faults, incoherent interface structures, and compositional variations within the first 3–4 Co:ZnO layers next to the Al2O3 substrate. The stacking fault density is in the range of 1017 cm−3. We also measure the local lattice distortions around the stacking faults. It is shown that despite the relatively high density of planar defects, lattice distortions, and small compositional variation, the Co:ZnO films retain paramagnetic properties.
000152036 536__ $$0G:(DE-HGF)POF2-424$$a424 - Exploratory materials and phenomena (POF2-424)$$cPOF2-424$$fPOF II$$x0
000152036 7001_ $$0P:(DE-HGF)0$$aNey, A.$$b1
000152036 7001_ $$0P:(DE-Juel1)145413$$aDuchamp, Martial$$b2$$ufzj
000152036 7001_ $$0P:(DE-HGF)0$$aNey, V.$$b3
000152036 7001_ $$0P:(DE-Juel1)144965$$aBoothroyd, Christopher Brian$$b4$$ufzj
000152036 7001_ $$0P:(DE-HGF)0$$aGalindo, P. L.$$b5
000152036 7001_ $$0P:(DE-HGF)0$$aKaspar, T. C.$$b6
000152036 7001_ $$0P:(DE-HGF)0$$aChambers, S. A.$$b7
000152036 7001_ $$0P:(DE-Juel1)144121$$aDunin-Borkowski, Rafal$$b8$$ufzj
000152036 773__ $$0PERI:(DE-600)1476463-5$$a10.1063/1.4851015$$p243503$$tJournal of applied physics$$v114$$x0021-8979$$y2013
000152036 8564_ $$uhttps://juser.fz-juelich.de/record/152036/files/FZJ-2014-01856.pdf$$yOpenAccess$$zPublished final document.
000152036 909CO $$ooai:juser.fz-juelich.de:152036$$pdnbdelivery$$pdriver$$pVDB$$popen_access$$popenaire
000152036 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)144926$$aForschungszentrum Jülich GmbH$$b0$$kFZJ
000152036 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)145413$$aForschungszentrum Jülich GmbH$$b2$$kFZJ
000152036 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)144965$$aForschungszentrum Jülich GmbH$$b4$$kFZJ
000152036 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)144121$$aForschungszentrum Jülich GmbH$$b8$$kFZJ
000152036 9132_ $$0G:(DE-HGF)POF3-424$$1G:(DE-HGF)POF3-420$$2G:(DE-HGF)POF3-400$$aDE-HGF$$bForschungsbereich Luftfahrt, Raumfahrt und Verkehr$$lRaumfahrt$$vResearch under Space Conditions$$x0
000152036 9131_ $$0G:(DE-HGF)POF2-424$$1G:(DE-HGF)POF2-420$$2G:(DE-HGF)POF2-400$$3G:(DE-HGF)POF2$$4G:(DE-HGF)POF$$aDE-HGF$$bSchlüsseltechnologien$$lGrundlagen zukünftiger Informationstechnologien$$vExploratory materials and phenomena$$x0
000152036 9141_ $$y2013
000152036 915__ $$0StatID:(DE-HGF)0150$$2StatID$$aDBCoverage$$bWeb of Science Core Collection
000152036 915__ $$0StatID:(DE-HGF)0100$$2StatID$$aJCR
000152036 915__ $$0StatID:(DE-HGF)0200$$2StatID$$aDBCoverage$$bSCOPUS
000152036 915__ $$0StatID:(DE-HGF)0110$$2StatID$$aWoS$$bScience Citation Index
000152036 915__ $$0StatID:(DE-HGF)0111$$2StatID$$aWoS$$bScience Citation Index Expanded
000152036 915__ $$0StatID:(DE-HGF)0510$$2StatID$$aOpenAccess
000152036 915__ $$0StatID:(DE-HGF)0010$$2StatID$$aJCR/ISI refereed
000152036 915__ $$0StatID:(DE-HGF)0400$$2StatID$$aAllianz-Lizenz / DFG
000152036 915__ $$0StatID:(DE-HGF)0300$$2StatID$$aDBCoverage$$bMedline
000152036 915__ $$0StatID:(DE-HGF)1020$$2StatID$$aDBCoverage$$bCurrent Contents - Social and Behavioral Sciences
000152036 915__ $$0StatID:(DE-HGF)0420$$2StatID$$aNationallizenz
000152036 915__ $$0StatID:(DE-HGF)0199$$2StatID$$aDBCoverage$$bThomson Reuters Master Journal List
000152036 920__ $$lyes
000152036 9201_ $$0I:(DE-Juel1)PGI-5-20110106$$kPGI-5$$lMikrostrukturforschung$$x0
000152036 9801_ $$aFullTexts
000152036 980__ $$ajournal
000152036 980__ $$aVDB
000152036 980__ $$aUNRESTRICTED
000152036 980__ $$aI:(DE-Juel1)PGI-5-20110106
000152036 981__ $$aI:(DE-Juel1)ER-C-1-20170209