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@ARTICLE{Mauer:153790,
author = {Mauer, Georg},
title = {{P}lasma {C}haracteristics and {P}lasma-{F}eedstock
{I}nteraction under {PS}-{PVD} {P}rocess {C}onditions},
journal = {Plasma chemistry and plasma processing},
volume = {34},
number = {5},
issn = {1572-8986},
address = {Dordrecht},
publisher = {Springer Science + Business Media B.V.},
reportid = {FZJ-2014-03278},
pages = {1171 - 1186},
year = {2014},
abstract = {Plasma spray-physical vapor deposition (PS-PVD) is a novel
coating process based on plasma spraying. In contrast to
conventional methods, deposition takes place not only from
liquid splats but also from nano-sized clusters and from the
vapor phase. This offers new opportunities to obtain
advanced microstructures and thus to comply with growing
demands on modern functional coatings. In this study,
different process conditions were investigated with regard
to the application of the PS-PVD process for ceramic thermal
barrier coatings. Plasma characteristics were calculated
under chemical equilibrium conditions by minimizing the
Gibbs energy. The plasma-feedstock interaction was modeled
taking into account the particular conditions at very low
pressure. Since the plasma is highly rarefied, the small
feedstock particles are in the free molecular flow regime.
Hence, continuum methods commonly used in fluid mechanics
and heat transfer approaches with continuous boundary
conditions are not appropriate; alternative methods based on
the kinetic theory of gases are required. The experimental
results confirm the predictions about the degree of
vaporization made by such calculations. In particular, they
show that the feedstock treatment mainly takes place within
the very first trajectory segment between injector and jet
expansion.},
cin = {IEK-1},
ddc = {540},
cid = {I:(DE-Juel1)IEK-1-20101013},
pnm = {122 - Power Plants (POF2-122)},
pid = {G:(DE-HGF)POF2-122},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000339834300009},
doi = {10.1007/s11090-014-9563-z},
url = {https://juser.fz-juelich.de/record/153790},
}