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@ARTICLE{Vasylyev:154049,
      author       = {Vasylyev, Olexsandr and Brychevskyi, Mykola and
                      Brodnikovskyi, Iegor and Firstov, Sergiy and Andrzejczuk,
                      Mariusz and Spychalski, Maciek and Lewandowska, Malgorzata
                      and Kurzydlowski, Krzysztof Jan and Steinberger-Wilckens,
                      Robert and Mertens, Josef and Malzbender, Jürgen},
      title        = {{N}ucleation and {G}rowth {M}echainsms of {Z}irconia {F}ilm
                      {D}eposited on {P}orous {N}ickel {O}xide - {Z}irconia
                      {S}ubstrate by {E}lectron {B}eam - {P}hysical {V}apor
                      {D}eposition},
      journal      = {Advances in Ceramic Science and Engineering},
      volume       = {3},
      number       = {2014},
      issn         = {2325-5129},
      address      = {Riley, Ind.},
      publisher    = {Science and Engineering Publishing Company (SEP)},
      reportid     = {FZJ-2014-03457},
      pages        = {25-35},
      year         = {2014},
      abstract     = {The structure of the transitional zone between a zirconia
                      film deposited by EB-PVD and its porous NiO-ZrO2 substrate
                      were studied using transmission and scanning electron
                      microscopy. The plausible condensation mechanisms of
                      zirconia from its vapor phase onto zirconia and nickel oxide
                      phases of the substrate were established. The condensation
                      of zirconia was identified as a two-stage process with two
                      mechanisms of growth, planar and cellular, similar to
                      solidification from the liquid phase. ZrO2 condensation on
                      ZrO2 and NiO phases occurs with different routes. During the
                      planar growth on the ZrO2, the ZrO2 film nucleates and grows
                      up to ~0.3-0.5 μm with no orientation preference as
                      continuous "layer by layer" defective film. The planar ZrO2
                      film on the NiO of ~0.5-0.7 μm thickness is discontinuous
                      and porous; it consists of oriented structurally perfect
                      "islands". The differences found are probably the result of
                      differences in the melting temperature of ZrO2 and NiO, and
                      Zr and Ni affinities to oxygen as well as their different
                      behavior under high vacuum. The deposition affected zone
                      surrounding the ZrO2 nucleation site is
                      established.Keywords: Zirconia Film; Nucleation Mechanism;
                      Growth Mechanism; Thin Structure; Solid Oxide Fuel Cell;
                      Electron Beam – Physical Vapor Deposition},
      cin          = {IEK-9 / IEK-2},
      ddc          = {670},
      cid          = {I:(DE-Juel1)IEK-9-20110218 / I:(DE-Juel1)IEK-2-20101013},
      pnm          = {123 - Fuel Cells (POF2-123) / 152 - Renewable Energies
                      (POF2-152)},
      pid          = {G:(DE-HGF)POF2-123 / G:(DE-HGF)POF2-152},
      typ          = {PUB:(DE-HGF)16},
      url          = {https://juser.fz-juelich.de/record/154049},
}