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@ARTICLE{Krkknen:154092,
author = {Kärkkänen, Irina and Shkabko, Andrey and Heikkilä, Mikko
and Niinistö, Jaakko and Ritala, Mikko and Leskelä, Markku
and Hoffmann-Eifert, Susanne and Waser, R.},
title = {{S}tudy of atomic layer deposited {Z}r{O} 2 and {Z}r{O} 2
/{T}i{O} 2 films for resistive switching application},
journal = {Physica status solidi / A},
volume = {211},
number = {2},
issn = {1862-6300},
address = {Weinheim},
publisher = {Wiley-VCH},
reportid = {FZJ-2014-03494},
pages = {301 - 309},
year = {2014},
abstract = {Thin ZrO2 films and ZrO2/TiO2 bilayers grown by atomic
layer deposition (ALD) are integrated into
metal–oxide–metal (MOM) structures for investigation of
resistive switching (RS) properties. The films have
different microstructure depending on the used ALD oxygen
source and stacking sequence for the bilayers. Pt/ZrO2/Ti/Pt
devices show unipolar RS for oxide thicknesses of
11–18 nm. The devices with O3 grown ZrO2 show higher
yield in comparison to the ones with H2O processed oxide.
The switching polarity of the Pt/ZrO2/Ti/Pt cells depends on
the thickness of the Ti electrode layer. The increase of the
Ti layer thickness leads to a change in switching polarity
from unipolar to bipolar. The formation of ZrO2/TiO2
bilayers results in changes in the RS behavior of the MOM
cells depending on the stacking sequence.},
cin = {PGI-7},
ddc = {530},
cid = {I:(DE-Juel1)PGI-7-20110106},
pnm = {424 - Exploratory materials and phenomena (POF2-424)},
pid = {G:(DE-HGF)POF2-424},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000332000500008},
doi = {10.1002/pssa.201330034},
url = {https://juser.fz-juelich.de/record/154092},
}