| Home > Publications database > Defect-Structure - Property Relationships in aliovalently doped and non-stoichiometric Perovskite Oxides > print |
| 001 | 155191 | ||
| 005 | 20240709082213.0 | ||
| 037 | _ | _ | |a FZJ-2014-04372 |
| 041 | _ | _ | |a English |
| 100 | 1 | _ | |a Eichel, Rüdiger-A. |0 P:(DE-Juel1)156123 |b 0 |e Corresponding Author |u fzj |
| 111 | 2 | _ | |a International Symposium on Advanced Functional Materials |g ISAFM 2014 |c Kuala Lumpur |d 2014-08-01 - 2014-08-02 |w Malaysia |
| 245 | _ | _ | |a Defect-Structure - Property Relationships in aliovalently doped and non-stoichiometric Perovskite Oxides |
| 260 | _ | _ | |c 2014 |
| 336 | 7 | _ | |a Conference Presentation |b conf |m conf |0 PUB:(DE-HGF)6 |s 1408516610_5990 |2 PUB:(DE-HGF) |x Plenary/Keynote |
| 336 | 7 | _ | |a Conference Paper |0 33 |2 EndNote |
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| 500 | _ | _ | |a Rüdiger-A. EichelInstitut für Energie- und Klimaforschung (IEK-9), Forschungszentrum Jülich, Germanyr.eichel@fz-juelich.de |
| 502 | _ | _ | |c RWTH AAchen |
| 520 | _ | _ | |a Ferroelectric materials based on perovskite oxides offer the advantage that materials properties may be systematically tailored over a wide range either by controlling the microstructre in terms of processing or by means of aliovalent doping and defined non-stoichiometry [1]. Although the strategy of introducing atomic-scale defects that may form defect complexes, which in turn impact the mobility of ferroelectric domain walls, is valid not only for Pb[Zr,Ti]O3 (PZT), but also for lead-free alternatives [2] such as [Bi,Na]TiO3 (BNT) or [K,Na]NbO3 (KNN) for instance, the corresponding defect structure when using Fe2O3- or CuO-doping significantly differs from PZT with tetravalent B-site to KNN where the B-site is pentavalent.Focusing on 'hard' ferroelectrics, the energetics for the formation of dimeric [3,4] and trimeric [5,6] defect complexes between acceptor-type dopant ions and charge compensating oxygen vacancies is considered both from an experimental and theoretical perspective. Moreover, the position of these defects with respect to domain walls [7], their interaction with 180° and non-180° domain walls [5], as well as the reorientation of the defect dipoles during poling [8] is discussed.references:[1] R.-A. Eichel, H. Kungl and P. Jakes, Mat. Tech. 28 (2013) 5 241[2] R.-A. Eichel, H. Kungl, Funct. Mat. Lett. 3 (2010) 1–4[3] R.-A. Eichel, P. Erhart, P. Träskelin, K. Albe, H. Kungl and M.J. Hoffmann, Phys. Rev. Lett. 100 (2008) 095504[4] E. Aksel, E. Erdem, P. Jakes, J.L. Jones and R.-A. Eichel, Appl. Phys. Lett. 97 (2010) 012903[5] R.-A. Eichel, E. Erünal, P. Jakes, S. Körbel, C. Elsässer, H. Kungl, J. Acker and M.J. Hoffmann, Appl. Phys. Lett. 102 (2013) 242908[6] E. Erünal, P. Jakes, S. Körbel, J. Acker, H. Kungl, C. Elsässer, M.J. Hoffmann and R.-A. Eichel, Phys. Rev. B 84, (2011) 184113[7] P. Jakes, E. Erdem, R.-A. Eichel, L. Jin and D. Damjanovic, Appl. Phys. Lett. 98 (2011) 072907[8] L.X. Zhang, E. Erdem, X. Ren and R.-A. Eichel, Appl. Phys. Lett. 93 (2008) 202901 |
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