%0 Conference Paper
%A Knoll, L.
%A Zhao, Q.T.
%A Luptak, R.
%A Trellenkamp, S.
%A Bourdelle, K.K.
%A Mantl, S.
%T 20nm gate length Schottky MOSFETs with ultra thin NiSi/epitaxial NiSi2 source/drain
%M PreJuSER-15884
%D 2011
%Z Record converted from VDB: 12.11.2012
%< Proceedings of the 12th International Conference on Ultimate Integration on Silicon (ULIS). - 2011. - S. 38 - 41
%F PUB:(DE-HGF)8 ; PUB:(DE-HGF)7
%9 Contribution to a conference proceedingsContribution to a book
%U https://juser.fz-juelich.de/record/15884