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Impact of strain and Ge concentration on the performance of planar SiGe band-to-band-tunneling transistors
Schmidt, M.FZJ* ; Minamisawa, R. A.FZJ* ; Richter, S.FZJ* ; Hartmann, J. M.FZJ* ; Luptak, R.FZJ* ; Tiedemann, A.FZJ* ; Buca, D.FZJ* ; Zhao, Q. T.FZJ* ; Mantl, S.FZJ*
2011
201112 International Conference on Ultimate Integration on Silicon (ULIS)
Seminar, Cork, IrelandCork, Ireland, 14 Mar 20112011-03-14
Note: Record converted from VDB: 12.11.2012
Contributing Institute(s):
- Halbleiter-Nanoelektronik (PGI-9)
- Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
- Grundlagen für zukünftige Informationstechnologien (P42)
Appears in the scientific report
2011