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Lanthanum Lutetium oxide integration in a gate-first process on SOI MOSFETs
Nichau, A.FZJ* ; Durgun Özben, E.FZJ* ; Schnee, M.FZJ* ; Lopes, J. M. J.FZJ* ; Besmehn, A. ; Luysberg, M. ; Knoll, L.FZJ* ; Habicht, S.FZJ* ; Mussmann, V.FZJ* ; Luptak, R.FZJ* ; Lenk, S.FZJ* ; Rubio-Zuazo, J. ; Castro, G. R. ; Buca, D.FZJ* ; Zhao, Q. T.FZJ* ; Schubert, J.FZJ* ; Mantl, S.FZJ*
2011
201112 International Conference on Ultimate Integration on Silicon (ULIS)
Seminar, Cork, IrelandCork, Ireland, 14 Mar 20112011-03-14
Note: Record converted from VDB: 12.11.2012
Contributing Institute(s):
- Halbleiter-Nanoelektronik (PGI-9)
- Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
- Grundlagen für zukünftige Informationstechnologien (P42)
Appears in the scientific report
2011