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@ARTICLE{Soni:16631,
author = {Soni, R. and Meuffels, P. and Staikov, G. and Weng, R. and
Kügeler, C. and Petraru, A. and Hambe, M. and Waser, R. and
Kohlstedt, H.},
title = {{O}n the stochastic nature of resistive switching in {C}u
doped {G}e0.3{S}e0.7 based memory devices},
journal = {Journal of applied physics},
volume = {110},
issn = {0021-8979},
address = {Melville, NY},
publisher = {American Institute of Physics},
reportid = {PreJuSER-16631},
pages = {054509},
year = {2011},
note = {Record converted from VDB: 12.11.2012},
abstract = {Currently, there is great interest in using solid
electrolytes to develop resistive switching based
nonvolatile memories (RRAM) and logic devices. Despite
recent progress, our understanding of the microscopic origin
of the switching process and its stochastic behavior is
still limited. In order to understand this behavior, we
present a statistical "breakdown" analysis performed on Cu
doped Ge0.3Se0.7 based memory devices under elevated
temperature and constant voltage stress conditions.
Following the approach of electrochemical phase formation,
the precursor of the "ON resistance switching" is considered
to be nucleation - the emergence of small clusters of atoms
carrying the basic properties of the new phase which forms
the conducting filament. Within the framework of nucleation
theory, the observed fluctuations in the time required for
"ON resistance switching" are found to be consistent with
the stochastic nature of critical nucleus formation. (C)
2011 American Institute of Physics. [doi:10.1063/1.3631013]},
keywords = {J (WoSType)},
cin = {JARA-FIT / PGI-7},
ddc = {530},
cid = {$I:(DE-82)080009_20140620$ / I:(DE-Juel1)PGI-7-20110106},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
shelfmark = {Physics, Applied},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000294968600145},
doi = {10.1063/1.3631013},
url = {https://juser.fz-juelich.de/record/16631},
}