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Home > Publications database > Reversible and irreversible effects after oxygen exposure in thick (>1 μm) silicon films deposited by VHF-PECVD on glass substrates investigated by dual beam photoconductivity > Reviews
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Reversible and irreversible effects after oxygen exposure in thick (>1 μm) silicon films deposited by VHF-PECVD on glass substrates investigated by dual beam photoconductivity - FZJ-2014-05553
 
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