%0 Journal Article
%A Meier, Matthias
%A Paetzold, U. W.
%A Ghosh, M.
%A Zhang, W.
%A Merdzhanova, T.
%A Jost, G.
%A Sommer, N.
%A Michard, S.
%A Gordijn, A.
%T Fabrication of Light-Scattering Multiscale Textures by Nanoimprinting for the Application to Thin-Film Silicon Solar Cells
%J IEEE journal of photovoltaics
%V 4
%N 3
%@ 2156-3381
%C New York, NY
%I IEEE
%M FZJ-2014-05665
%P 772-777
%D 2014
%X In this study, nanoimprint processing was used to realize various multiscale textures on glass substrates for application in thin-film photovoltaic devices. The multiscale textures are formed by a combination of large and small features, which proofed to be beneficial for light trapping in silicon thin-film solar cells. Two approaches for the fabrication of multiscale textures are presented in this study. In the first approach, the multiscale texture is realized at the lacquer/transparent conductive oxide (TCO) interface, and in the second approach, the multiscale texture is realized at the TCO/Si interface. Various types of multiscale textures were fabricated and tested in microcrystalline thin-film silicon solar cells in p-i-n configuration to identify the optimal texture for the light management. It was found that the best light-scattering multiscale texture was realized using an imprint-textured glass substrate, which contains large craters, in combination with HF-etched TCO (ZnO:Al), which contains small features, on top of the imprint. With this structure (of the second approach), the short-circuit current density of the solar cell devices was improved by 0.6 mA/cm2 using multiscale textures realized by nanoimprint processing.
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000335226400003
%R 10.1109/JPHOTOV.2014.2311233
%U https://juser.fz-juelich.de/record/172155