TY  - JOUR
AU  - Meier, Matthias
AU  - Paetzold, U. W.
AU  - Ghosh, M.
AU  - Zhang, W.
AU  - Merdzhanova, T.
AU  - Jost, G.
AU  - Sommer, N.
AU  - Michard, S.
AU  - Gordijn, A.
TI  - Fabrication of Light-Scattering Multiscale Textures by Nanoimprinting for the Application to Thin-Film Silicon Solar Cells
JO  - IEEE journal of photovoltaics
VL  - 4
IS  - 3
SN  - 2156-3381
CY  - New York, NY
PB  - IEEE
M1  - FZJ-2014-05665
SP  - 772-777
PY  - 2014
AB  - In this study, nanoimprint processing was used to realize various multiscale textures on glass substrates for application in thin-film photovoltaic devices. The multiscale textures are formed by a combination of large and small features, which proofed to be beneficial for light trapping in silicon thin-film solar cells. Two approaches for the fabrication of multiscale textures are presented in this study. In the first approach, the multiscale texture is realized at the lacquer/transparent conductive oxide (TCO) interface, and in the second approach, the multiscale texture is realized at the TCO/Si interface. Various types of multiscale textures were fabricated and tested in microcrystalline thin-film silicon solar cells in p-i-n configuration to identify the optimal texture for the light management. It was found that the best light-scattering multiscale texture was realized using an imprint-textured glass substrate, which contains large craters, in combination with HF-etched TCO (ZnO:Al), which contains small features, on top of the imprint. With this structure (of the second approach), the short-circuit current density of the solar cell devices was improved by 0.6 mA/cm2 using multiscale textures realized by nanoimprint processing.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000335226400003
DO  - DOI:10.1109/JPHOTOV.2014.2311233
UR  - https://juser.fz-juelich.de/record/172155
ER  -