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@ARTICLE{Meier:172155,
      author       = {Meier, Matthias and Paetzold, U. W. and Ghosh, M. and
                      Zhang, W. and Merdzhanova, T. and Jost, G. and Sommer, N.
                      and Michard, S. and Gordijn, A.},
      title        = {{F}abrication of {L}ight-{S}cattering {M}ultiscale
                      {T}extures by {N}anoimprinting for the {A}pplication to
                      {T}hin-{F}ilm {S}ilicon {S}olar {C}ells},
      journal      = {IEEE journal of photovoltaics},
      volume       = {4},
      number       = {3},
      issn         = {2156-3381},
      address      = {New York, NY},
      publisher    = {IEEE},
      reportid     = {FZJ-2014-05665},
      pages        = {772-777},
      year         = {2014},
      abstract     = {In this study, nanoimprint processing was used to realize
                      various multiscale textures on glass substrates for
                      application in thin-film photovoltaic devices. The
                      multiscale textures are formed by a combination of large and
                      small features, which proofed to be beneficial for light
                      trapping in silicon thin-film solar cells. Two approaches
                      for the fabrication of multiscale textures are presented in
                      this study. In the first approach, the multiscale texture is
                      realized at the lacquer/transparent conductive oxide (TCO)
                      interface, and in the second approach, the multiscale
                      texture is realized at the TCO/Si interface. Various types
                      of multiscale textures were fabricated and tested in
                      microcrystalline thin-film silicon solar cells in p-i-n
                      configuration to identify the optimal texture for the light
                      management. It was found that the best light-scattering
                      multiscale texture was realized using an imprint-textured
                      glass substrate, which contains large craters, in
                      combination with HF-etched TCO (ZnO:Al), which contains
                      small features, on top of the imprint. With this structure
                      (of the second approach), the short-circuit current density
                      of the solar cell devices was improved by 0.6 mA/cm2 using
                      multiscale textures realized by nanoimprint processing.},
      cin          = {IEK-5},
      ddc          = {530},
      cid          = {I:(DE-Juel1)IEK-5-20101013},
      pnm          = {111 - Thin Film Photovoltaics (POF2-111)},
      pid          = {G:(DE-HGF)POF2-111},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000335226400003},
      doi          = {10.1109/JPHOTOV.2014.2311233},
      url          = {https://juser.fz-juelich.de/record/172155},
}