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| Home > Publications database > Fabrication of Light-Scattering Multiscale Textures by Nanoimprinting for the Application to Thin-Film Silicon Solar Cells > print |
| 001 | 172155 | ||
| 005 | 20240712084455.0 | ||
| 024 | 7 | _ | |a 10.1109/JPHOTOV.2014.2311233 |2 doi |
| 024 | 7 | _ | |a WOS:000335226400003 |2 WOS |
| 037 | _ | _ | |a FZJ-2014-05665 |
| 041 | _ | _ | |a English |
| 082 | _ | _ | |a 530 |
| 100 | 1 | _ | |a Meier, Matthias |0 P:(DE-Juel1)130830 |b 0 |e Corresponding Author |
| 245 | _ | _ | |a Fabrication of Light-Scattering Multiscale Textures by Nanoimprinting for the Application to Thin-Film Silicon Solar Cells |
| 260 | _ | _ | |a New York, NY |c 2014 |b IEEE |
| 336 | 7 | _ | |a Journal Article |b journal |m journal |0 PUB:(DE-HGF)16 |s 1415701698_21364 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 520 | _ | _ | |a In this study, nanoimprint processing was used to realize various multiscale textures on glass substrates for application in thin-film photovoltaic devices. The multiscale textures are formed by a combination of large and small features, which proofed to be beneficial for light trapping in silicon thin-film solar cells. Two approaches for the fabrication of multiscale textures are presented in this study. In the first approach, the multiscale texture is realized at the lacquer/transparent conductive oxide (TCO) interface, and in the second approach, the multiscale texture is realized at the TCO/Si interface. Various types of multiscale textures were fabricated and tested in microcrystalline thin-film silicon solar cells in p-i-n configuration to identify the optimal texture for the light management. It was found that the best light-scattering multiscale texture was realized using an imprint-textured glass substrate, which contains large craters, in combination with HF-etched TCO (ZnO:Al), which contains small features, on top of the imprint. With this structure (of the second approach), the short-circuit current density of the solar cell devices was improved by 0.6 mA/cm2 using multiscale textures realized by nanoimprint processing. |
| 536 | _ | _ | |a 111 - Thin Film Photovoltaics (POF2-111) |0 G:(DE-HGF)POF2-111 |c POF2-111 |f POF II |x 0 |
| 588 | _ | _ | |a Dataset connected to CrossRef, juser.fz-juelich.de |
| 700 | 1 | _ | |a Paetzold, U. W. |0 P:(DE-Juel1)130282 |b 1 |u fzj |
| 700 | 1 | _ | |a Ghosh, M. |0 P:(DE-Juel1)151168 |b 2 |u fzj |
| 700 | 1 | _ | |a Zhang, W. |0 P:(DE-Juel1)130310 |b 3 |
| 700 | 1 | _ | |a Merdzhanova, T. |0 P:(DE-Juel1)130268 |b 4 |u fzj |
| 700 | 1 | _ | |a Jost, G. |0 P:(DE-Juel1)139528 |b 5 |u fzj |
| 700 | 1 | _ | |a Sommer, N. |0 P:(DE-Juel1)145392 |b 6 |u fzj |
| 700 | 1 | _ | |a Michard, S. |0 P:(DE-Juel1)141652 |b 7 |u fzj |
| 700 | 1 | _ | |a Gordijn, A. |0 P:(DE-Juel1)130242 |b 8 |u fzj |
| 773 | _ | _ | |a 10.1109/JPHOTOV.2014.2311233 |0 PERI:(DE-600)2585714-9 |n 3 |p 772-777 |t IEEE journal of photovoltaics |v 4 |y 2014 |x 2156-3381 |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/172155/files/FZJ-2014-05665.pdf |y Restricted |
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| 913 | 2 | _ | |a DE-HGF |b POF III |l Forschungsbereich Energie |1 G:(DE-HGF)POF3-120 |0 G:(DE-HGF)POF3-121 |2 G:(DE-HGF)POF3-100 |v Erneuerbare Energien |x 0 |
| 913 | 1 | _ | |a DE-HGF |b Energie |l Erneuerbare Energien |1 G:(DE-HGF)POF2-110 |0 G:(DE-HGF)POF2-111 |2 G:(DE-HGF)POF2-100 |v Thin Film Photovoltaics |x 0 |4 G:(DE-HGF)POF |3 G:(DE-HGF)POF2 |
| 914 | 1 | _ | |y 2014 |
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