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024 7 _ |a 10.1021/jp506938k
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037 _ _ |a FZJ-2014-05877
041 _ _ |a English
082 _ _ |a 540
100 1 _ |a Solís, Cecilia
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245 _ _ |a Particular Transport Properties of NiFe 2 O 4 Thin Films at High Temperatures
260 _ _ |a Washington, DC
|c 2014
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336 7 _ |a Journal Article
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520 _ _ |a NiFe2O4 (NFO) thin films were deposited on quartz substrates by rf magnetron sputtering, and the influence of the deposition conditions on their physic-chemical properties was studied. The films structure and the high temperature transport properties were analyzed as a function of the deposition temperature. The analysis of the total conductivity up to 800 °C in different pO2 containing atmospheres showed a distinct electronic behavior of the films with regard to the bulk NFO material. Indeed, the thin films exhibit p-type electronic conductivity, while the bulk material is known to be a prevailing n-type electronic conductor. This difference is ascribed to the dissimilar concentration of Ni3+ in the thin films, as revealed by XPS analysis at room temperature. The bulk material with a low concentration of Ni3+ (Ni3+/Ni2+ ratio of 0.20) shows the expected n-type electronic conduction via electron hopping between Fe3+–Fe2+. On the other hand, the NFO thin films annealed at 800 °C exhibit a Ni3+/Ni2+ ratio of 0.42 and show p-type conduction via hole hopping between Ni3+–Ni2+.
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700 1 _ |a Somacescu, Simona
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700 1 _ |a Palafox, Elena
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700 1 _ |a Balaguer, María
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700 1 _ |a Serra, José M.
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773 _ _ |a 10.1021/jp506938k
|g Vol. 118, no. 42, p. 24266 - 24273
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|p 24266 - 24273
|t The @journal of physical chemistry / C
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