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000173139 1001_ $$0P:(DE-Juel1)141640$$aPatt, M.$$b0$$eCorresponding Author$$ufzj
000173139 245__ $$aBulk sensitive hard x-ray photoemission electron microscopy
000173139 260__ $$a[S.l.]$$bAmerican Institute of Physics$$c2014
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000173139 520__ $$aHard x-ray photoelectron spectroscopy (HAXPES) has now matured into a well-established technique as a bulk sensitive probe of the electronic structure due to the larger escape depth of the highly energetic electrons. In order to enable HAXPES studies with high lateral resolution, we have set up a dedicated energy-filtered hard x-ray photoemission electron microscope (HAXPEEM) working with electron kinetic energies up to 10 keV. It is based on the NanoESCA design and also preserves the performance of the instrument in the low and medium energy range. In this way, spectromicroscopy can be performed from threshold to hard x-ray photoemission. The high potential of the HAXPEEM approach for the investigation of buried layers and structures has been shown already on a layered and structured SrTiO3 sample. Here, we present results of experiments with test structures to elaborate the imaging and spectroscopic performance of the instrument and show the capabilities of the method to image bulk properties. Additionally, we introduce a method to determine the effective attenuation length of photoelectrons in a direct photoemission experiment.© 2014 AIP Publishing LLC
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000173139 7001_ $$0P:(DE-Juel1)131035$$aWiemann, C.$$b1$$ufzj
000173139 7001_ $$0P:(DE-HGF)0$$aWeber, N.$$b2
000173139 7001_ $$0P:(DE-HGF)0$$aEscher, M.$$b3
000173139 7001_ $$0P:(DE-HGF)0$$aGloskovskii, A.$$b4
000173139 7001_ $$0P:(DE-HGF)0$$aDrube, W.$$b5
000173139 7001_ $$0P:(DE-HGF)0$$aMerkel, M.$$b6
000173139 7001_ $$0P:(DE-Juel1)130948$$aSchneider, C. M.$$b7$$ufzj
000173139 773__ $$0PERI:(DE-600)1472905-2$$a10.1063/1.4902141$$gVol. 85, no. 11, p. 113704 -$$n11$$p113704$$tReview of scientific instruments$$v85$$x1089-7623$$y2014
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