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@ARTICLE{Patt:173139,
author = {Patt, M. and Wiemann, C. and Weber, N. and Escher, M. and
Gloskovskii, A. and Drube, W. and Merkel, M. and Schneider,
C. M.},
title = {{B}ulk sensitive hard x-ray photoemission electron
microscopy},
journal = {Review of scientific instruments},
volume = {85},
number = {11},
issn = {1089-7623},
address = {[S.l.]},
publisher = {American Institute of Physics},
reportid = {FZJ-2014-06552},
pages = {113704},
year = {2014},
abstract = {Hard x-ray photoelectron spectroscopy (HAXPES) has now
matured into a well-established technique as a bulk
sensitive probe of the electronic structure due to the
larger escape depth of the highly energetic electrons. In
order to enable HAXPES studies with high lateral resolution,
we have set up a dedicated energy-filtered hard x-ray
photoemission electron microscope (HAXPEEM) working with
electron kinetic energies up to 10 keV. It is based on the
NanoESCA design and also preserves the performance of the
instrument in the low and medium energy range. In this way,
spectromicroscopy can be performed from threshold to hard
x-ray photoemission. The high potential of the HAXPEEM
approach for the investigation of buried layers and
structures has been shown already on a layered and
structured SrTiO3 sample. Here, we present results of
experiments with test structures to elaborate the imaging
and spectroscopic performance of the instrument and show the
capabilities of the method to image bulk properties.
Additionally, we introduce a method to determine the
effective attenuation length of photoelectrons in a direct
photoemission experiment.© 2014 AIP Publishing LLC},
cin = {PGI-6 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)PGI-6-20110106 / $I:(DE-82)080009_20140620$},
pnm = {422 - Spin-based and quantum information (POF2-422)},
pid = {G:(DE-HGF)POF2-422},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000345646000266},
pubmed = {25430117},
doi = {10.1063/1.4902141},
url = {https://juser.fz-juelich.de/record/173139},
}