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High-temperature conduction and charge compensation mechanisms at the LAO/STO-interface
Gunkel, F.FZJ* ; Hoffmann-Eifert, S.FZJ* ; Brinks, P. ; Kleibeuker, J. ; Huijben, M. ; Rijnders, G. ; Koster, G. ; Waser, R.FZJ*
2011
20111th International Workshop on Oxide Electronics
Seminar, Napa Valley, California, USANapa Valley, California, USA, 26 Sep 20112011-09-26
Note: Record converted from VDB: 12.11.2012
Contributing Institute(s):
- Elektronische Materialien (PGI-7)
- Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
- Grundlagen für zukünftige Informationstechnologien (P42)
Appears in the scientific report
2011