TY  - JOUR
AU  - Zhuang, Chunqiang
AU  - Schlempert, Christoph
AU  - Fuchs, Regina
AU  - Zhang, Lei
AU  - Huang, Nan
AU  - Vogel, Michael
AU  - Staedtler, Thorsten
AU  - Jiang, Xin
TI  - Mechanical behavior related to various bonding states in amorphous Si–C–N hard films
JO  - Surface and coatings technology
VL  - 258
SN  - 0257-8972
CY  - Amsterdam [u.a.]
PB  - Elsevier Science
M1  - FZJ-2015-00870
SP  - 353 - 358
PY  - 2014
AB  - A series of amorphous Si–C–N hard films were prepared by an electron cyclotron resonance chemical vapor deposition method. Microstructure characterization revealed that amorphous Si–C–N hard films contained various bonding states. Among them, Sisingle bondN and Sisingle bondC bonds played a leading role in determining the microstructure of amorphous Si–C–N hard films. Mechanical measurements showed that the hardness of these films varied between 17 GPa and 28 GPa as a function of the tetramethylsilane flow rate. A close relation between various bonding states and hardness was found. The variation of hardness was dominated by the bond fraction that corresponded to various bonding states. Macroscopic mechanical properties of a material were illustrated from the perspective of microscopic structural characterization.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000346895000044
DO  - DOI:10.1016/j.surfcoat.2014.09.002
UR  - https://juser.fz-juelich.de/record/187196
ER  -