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@ARTICLE{Desmarais:18764,
      author       = {Desmarais, J. and Ihlefeld, J.F. and Heeg, T. and Schubert,
                      J. and Schlom, D.G. and Huey, B.D.},
      title        = {{M}apping and statistics of ferroelectric domain boundary
                      angles and types},
      journal      = {Applied physics letters},
      volume       = {99},
      issn         = {0003-6951},
      address      = {Melville, NY},
      publisher    = {American Institute of Physics},
      reportid     = {PreJuSER-18764},
      pages        = {162902},
      year         = {2011},
      note         = {BDH and JD recognize support from the Department of Energy,
                      Grant No. DE-SC-0005037. JFI, TH, and DGS were supported by
                      the Army Research Office, Grant No. W911NF-08-2-0032. Sandia
                      National Laboratories is a multi-program laboratory managed
                      and operated by Sandia Corporation, a wholly owned
                      subsidiary of Lockheed Martin Corporation, for the U.S.
                      Department of Energy's National Nuclear Security
                      Administration, Contract No. DE-AC04-94AL85000.},
      abstract     = {Ferroelectric domain orientations have been mapped using
                      piezo-force microscopy, allowing the calculation and
                      statistical analysis of interfacial polarization angles, the
                      head-to-tail or head-to-head configuration, and any
                      cross-coupling terms. Within 1 mu m(2) of an epitaxial
                      (001)(p)-oriented BiFeO3 film, there are >40 mu m of linear
                      domain boundary based on over 500 interfaces. 71 degrees
                      domain walls dominate the interfacial polarization angles,
                      with a 2:1 preference for uncharged head-to-tail versus
                      charged head-to-head boundary types. This mapping technique
                      offers a unique perspective on domain boundary
                      distributions, important for ferroelectric and multiferroic
                      applications where domain wall parameters are critical. (C)
                      2011 American Institute of Physics. [doi:10.1063/1.3643155]},
      keywords     = {J (WoSType)},
      cin          = {JARA-FIT / PGI-9},
      ddc          = {530},
      cid          = {$I:(DE-82)080009_20140620$ / I:(DE-Juel1)PGI-9-20110106},
      pnm          = {Grundlagen für zukünftige Informationstechnologien},
      pid          = {G:(DE-Juel1)FUEK412},
      shelfmark    = {Physics, Applied},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000296517600058},
      doi          = {10.1063/1.3643155},
      url          = {https://juser.fz-juelich.de/record/18764},
}