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@ARTICLE{Mikulics:189501,
author = {Mikulics, M. and Hardtdegen, Hilde and Arango, Yulieth and
Adam, Roman and Fox, Alfred and Grützmacher, Detlev and
Gregušová, D. and Stanček, S. and Novák, J. and Kordoš,
P. and Sofer, Z. and Juul, L. and Marso, M.},
title = {{R}eduction of skin effect losses in double-level-{T}-gate
structure},
journal = {Applied physics letters},
volume = {105},
number = {23},
issn = {1077-3118},
address = {Melville, NY},
publisher = {American Inst. of Physics},
reportid = {FZJ-2015-02658},
pages = {232102},
year = {2014},
abstract = {We developed a T-gate technology based on selective wet
etching yielding 200 nm wide T-gate structures used for
fabrication of High Electron Mobility Transistors (HEMT).
Major advantages of our process are the use of only standard
photolithographic process and the ability to generate T-gate
stacks. A HEMT fabricated on AlGaN/GaN/sapphire with gate
length Lg¼200 nm and double-stacked T-gates exhibits 60 GHz
cutoff frequency showing ten-fold improvement compared to 6
GHz for the same device with 2 lm gate length. HEMTs with a
double-level-T-gate (DLTG) structure exhibit up to $35\%$
improvement of fmax value compared to a single T-gate
device. This indicates a significant reduction of skin
effect losses in DLTG structure compared to its standard
T-gate counterpart. These results agree with the theoretical
predictions.},
cin = {PGI-9 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
pnm = {423 - Sensorics and bioinspired systems (POF2-423)},
pid = {G:(DE-HGF)POF2-423},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000346266000044},
doi = {10.1063/1.4903468},
url = {https://juser.fz-juelich.de/record/189501},
}