%0 Journal Article
%A Hüpkes, J.
%A Owen, J. I.
%A Pust, S. E.
%A Bunte, E.
%T Chemical Etching of Zinc Oxide for Thin-Film Silicon Solar Cells
%J ChemPhysChem
%V 13
%C Weinheim
%I Wiley-VCH Verl.
%M PreJuSER-19931
%P 66 - 73
%D 2012
%Z Record converted from JUWEL: 18.07.2013
%< ChemPhysChem 2012, 13, 66 – 73
%X Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a certain threshold, that is defined by the deposition conditions and etching solution. Additionally, several approaches to modify the etching behavior through special preparation and etching steps are provided.
%K J (WoSType)
%F PUB:(DE-HGF)16
%9 Journal Article
%$ pmid:22162035
%U <Go to ISI:>//WOS:000298913500007
%R 10.1002/cphc.201100738
%U https://juser.fz-juelich.de/record/19931