TY  - JOUR
AU  - Flikweert, A.J.
AU  - Zimmermann, T.
AU  - Merdzhanova, T.
AU  - Weigand, D.
AU  - Appenzeller, W.
AU  - Gordijn, A.
TI  - Microcrystalline thin-film solar cell deposition on moving substrates using a linear VHF-PECVD reactor and a cross-flow geometry
JO  - Journal of physics / D
VL  - 45
SN  - 0022-3727
CY  - Bristol
PB  - IOP Publ.
M1  - PreJuSER-19933
SP  - 015101
PY  - 2012
N1  - We acknowledge the Bundesministerium fur Umwelt, Naturschutz und Reaktorsicherheit for the financial support, project number 0325024A and investment project 0327625. The authors want to thank J Wordenweber, M Hulsbeck, W Reetz, S Michard, W Beyer and U Rau, as well as Von Ardenne Anlagentechnik, Forschungs- und Applikationslabor Plasmatechnik, and Dresden University of Technology for their support.
AB  - A concept for high-rate plasma deposition (PECVD) of hydrogenated microcrystalline silicon on moving substrates (dynamic deposition) is developed and evaluated. The chamber allows for substrates up to a size of 40 x 40 cm(2). The deposition plasma is sustained between linear VHF electrodes (60 MHz) and a moving substrate. Due to the gas flow geometry and the high degree of source gas depletion, from the carrier's point of view the silane concentration varies when passing the electrodes. This is known to lead to different growth conditions which can induce transitions from microcrystalline to amorphous growth. The effect of different silane concentrations is simulated at a standard RF showerhead electrode by intentionally varying the silane concentration during deposition in static mode. This variation may decrease the layer quality of microcrystalline silicon, due to a shift of the crystallinity away from the optimum. However, adapting the input silane concentration, state-of-the-art solar cells are obtained. Microcrystalline cells (ZnO : Al/Ag back contacts) produced by the linear VHF plasma sources show an efficiency of 7.9% and 6.6% for depositions in static and dynamic mode, respectively.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000298290000006
DO  - DOI:10.1088/0022-3727/45/1/015101
UR  - https://juser.fz-juelich.de/record/19933
ER  -