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@ARTICLE{Flikweert:19933,
      author       = {Flikweert, A.J. and Zimmermann, T. and Merdzhanova, T. and
                      Weigand, D. and Appenzeller, W. and Gordijn, A.},
      title        = {{M}icrocrystalline thin-film solar cell deposition on
                      moving substrates using a linear {VHF}-{PECVD} reactor and a
                      cross-flow geometry},
      journal      = {Journal of physics / D},
      volume       = {45},
      issn         = {0022-3727},
      address      = {Bristol},
      publisher    = {IOP Publ.},
      reportid     = {PreJuSER-19933},
      pages        = {015101},
      year         = {2012},
      note         = {We acknowledge the Bundesministerium fur Umwelt,
                      Naturschutz und Reaktorsicherheit for the financial support,
                      project number 0325024A and investment project 0327625. The
                      authors want to thank J Wordenweber, M Hulsbeck, W Reetz, S
                      Michard, W Beyer and U Rau, as well as Von Ardenne
                      Anlagentechnik, Forschungs- und Applikationslabor
                      Plasmatechnik, and Dresden University of Technology for
                      their support.},
      abstract     = {A concept for high-rate plasma deposition (PECVD) of
                      hydrogenated microcrystalline silicon on moving substrates
                      (dynamic deposition) is developed and evaluated. The chamber
                      allows for substrates up to a size of 40 x 40 cm(2). The
                      deposition plasma is sustained between linear VHF electrodes
                      (60 MHz) and a moving substrate. Due to the gas flow
                      geometry and the high degree of source gas depletion, from
                      the carrier's point of view the silane concentration varies
                      when passing the electrodes. This is known to lead to
                      different growth conditions which can induce transitions
                      from microcrystalline to amorphous growth. The effect of
                      different silane concentrations is simulated at a standard
                      RF showerhead electrode by intentionally varying the silane
                      concentration during deposition in static mode. This
                      variation may decrease the layer quality of microcrystalline
                      silicon, due to a shift of the crystallinity away from the
                      optimum. However, adapting the input silane concentration,
                      state-of-the-art solar cells are obtained. Microcrystalline
                      cells (ZnO : Al/Ag back contacts) produced by the linear VHF
                      plasma sources show an efficiency of $7.9\%$ and $6.6\%$ for
                      depositions in static and dynamic mode, respectively.},
      keywords     = {J (WoSType)},
      cin          = {IEK-5},
      ddc          = {530},
      cid          = {I:(DE-Juel1)IEK-5-20101013},
      pnm          = {Erneuerbare Energien},
      pid          = {G:(DE-Juel1)FUEK401},
      shelfmark    = {Physics, Applied},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000298290000006},
      doi          = {10.1088/0022-3727/45/1/015101},
      url          = {https://juser.fz-juelich.de/record/19933},
}