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000201086 1001_ $$0P:(DE-HGF)0$$aTayal, Akhil$$b0
000201086 245__ $$aCorrelation between iron self-diffusion and thermal stability in doped iron nitride thin films
000201086 260__ $$aMelville, NY$$bAmerican Inst. of Physics$$c2014
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000201086 520__ $$aNanocrystalline Fe-X-N thin films (with doping X = 0, 3.1 at. % Al, 1.6 at. % Zr), were deposited using reactive ion beam sputtering. Magnetization study reveals that the deposited films exhibit a perpendicular magnetic anisotropy. Thermal stability of the films was investigated systematically and it was observed that the structural and the magnetic stability gets significantly enhanced with Al doping, whereas Zr doping has only a marginal effect. Fe self-diffusion, obtained using polarized neutron reflectivity, shows a suppression with both additives. A correlation between the thermal stability and the diffusion process gives a direct evidence that the enhancement in the thermal stability is primarily diffusion controlled. A combined picture of diffusion, structural, and magnetic stability has been drawn to understand the obtained results.
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000201086 65017 $$0V:(DE-MLZ)GC-1603-2016$$2V:(DE-HGF)$$aChemical Reactions and Advanced Materials$$x0
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000201086 7001_ $$0P:(DE-HGF)0$$aGupta, Mukul$$b1$$eCorresponding Author
000201086 7001_ $$0P:(DE-HGF)0$$aKumar, D.$$b2
000201086 7001_ $$0P:(DE-HGF)0$$aReddy, V. R.$$b3
000201086 7001_ $$0P:(DE-HGF)0$$aGupta, Ajay$$b4
000201086 7001_ $$0P:(DE-HGF)0$$aAmir, S. M.$$b5
000201086 7001_ $$0P:(DE-HGF)0$$aKorelis, Panagiotis$$b6
000201086 7001_ $$0P:(DE-HGF)0$$aStahn, Jochen$$b7
000201086 773__ $$0PERI:(DE-600)1476463-5$$a10.1063/1.4902962$$gVol. 116, no. 22, p. 222206 -$$n22$$p222206$$tJournal of applied physics$$v116$$x1089-7550$$y2014
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