Hauptseite > Publikationsdatenbank > Correlation between iron self-diffusion and thermal stability in doped iron nitride thin films > print

001     201086
005     20240619091139.0
024 7 _ |a 10.1063/1.4902962
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024 7 _ |a 0148-6349
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041 _ _ |a English
082 _ _ |a 530
100 1 _ |a Tayal, Akhil
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245 _ _ |a Correlation between iron self-diffusion and thermal stability in doped iron nitride thin films
260 _ _ |a Melville, NY
|c 2014
|b American Inst. of Physics
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520 _ _ |a Nanocrystalline Fe-X-N thin films (with doping X = 0, 3.1 at. % Al, 1.6 at. % Zr), were deposited using reactive ion beam sputtering. Magnetization study reveals that the deposited films exhibit a perpendicular magnetic anisotropy. Thermal stability of the films was investigated systematically and it was observed that the structural and the magnetic stability gets significantly enhanced with Al doping, whereas Zr doping has only a marginal effect. Fe self-diffusion, obtained using polarized neutron reflectivity, shows a suppression with both additives. A correlation between the thermal stability and the diffusion process gives a direct evidence that the enhancement in the thermal stability is primarily diffusion controlled. A combined picture of diffusion, structural, and magnetic stability has been drawn to understand the obtained results.
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650 2 7 |a Condensed Matter Physics
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650 1 7 |a Chemical Reactions and Advanced Materials
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700 1 _ |a Gupta, Mukul
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700 1 _ |a Kumar, D.
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700 1 _ |a Reddy, V. R.
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700 1 _ |a Gupta, Ajay
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700 1 _ |a Amir, S. M.
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700 1 _ |a Korelis, Panagiotis
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700 1 _ |a Stahn, Jochen
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773 _ _ |a 10.1063/1.4902962
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|t Journal of applied physics
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910 1 _ |a Forschungszentrum Jülich GmbH
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914 1 _ |y 2015
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