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@ARTICLE{Boussinot:201464,
      author       = {Boussinot, G. and Brener, Efim},
      title        = {{I}nterface kinetics in phase-field models: {I}sothermal
                      transformations in binary alloys and step dynamics in
                      molecular-beam epitaxy},
      journal      = {Physical review / E},
      volume       = {88},
      number       = {2},
      issn         = {1539-3755},
      address      = {College Park, Md.},
      publisher    = {APS},
      reportid     = {FZJ-2015-03759},
      pages        = {022406},
      year         = {2013},
      abstract     = {We present a unified description of interface kinetic
                      effects in phase-field models for isothermal transformations
                      in binary alloys and steps dynamics in
                      molecular-beam-epitaxy. The phase-field equations of motion
                      incorporate a kinetic cross-coupling between the phase field
                      and the concentration field. This cross-coupling generalizes
                      the phenomenology of kinetic effects and was omitted until
                      recently in classical phase-field models. We derive general
                      expressions (independent of the details of the phase-field
                      model) for the kinetic coefficients within the corresponding
                      macroscopic approach using a physically motivated reduction
                      procedure. The latter is equivalent to the so-called
                      thin-interface limit but is technically simpler. It involves
                      the calculation of the effective dissipation that can be
                      ascribed to the interface in the phase-field model. We
                      discuss in detail the possibility of a nonpositive definite
                      matrix of kinetic coefficients, i.e., a negative effective
                      interface dissipation, although being in the range of
                      stability of the underlying phase-field model. Numerically
                      we study the step-bunching instability in
                      molecular-beam-epitaxy due to the Ehrlich-Schwoebel effect,
                      present in our model due to the cross-coupling. Using the
                      reduction procedure we compare the results of the
                      phase-field simulations with the analytical predictions of
                      the macroscopic approach.},
      cin          = {PGI-2},
      ddc          = {530},
      cid          = {I:(DE-Juel1)PGI-2-20110106},
      pnm          = {421 - Frontiers of charge based Electronics (POF2-421)},
      pid          = {G:(DE-HGF)POF2-421},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000323576400009},
      doi          = {10.1103/PhysRevE.88.022406},
      url          = {https://juser.fz-juelich.de/record/201464},
}