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@ARTICLE{Knoll:202365,
author = {Knoll, Lars and Zhao, Qing-Tai and Nichau, Alexander and
Trellenkamp, Stefan and Richter, Simon and Schafer, Anna and
Esseni, David and Selmi, Luca and Bourdelle, Konstantin K.
and Mantl, Siegfried},
title = {{I}nverters {W}ith {S}trained {S}i {N}anowire
{C}omplementary {T}unnel {F}ield-{E}ffect {T}ransistors},
journal = {IEEE electron device letters},
volume = {34},
number = {6},
issn = {1558-0563},
address = {New York, NY},
publisher = {IEEE},
reportid = {FZJ-2015-04626},
pages = {813 - 815},
year = {2013},
abstract = {Inverters based on uniaxially tensile strained Si (sSi)
nanowire (NW) tunneling field-effect transistors (TFETs) are
fabricated. Tilted dopant implantation using the gate as a
shadow mask allows self-aligned formation of p-i-n TFETs.
The steep junctions formed by dopant segregation at low
temperatures improve the band-to-band tunneling, resulting
in higher on-currents of n- and p-TFETs of > 10 μA/μm at
VDS=0.5 V. The subthreshold slope for n-channel TFETs
reaches a minimum value of 30 mV/dec, and is <; 60 mV/dec
over one order of magnitude of drain current. The first sSi
NW complementary TFET inverters show sharp transitions and
fairly high static gain even at very lowVDD=0.2 V. The first
transient response analysis of the inverters shows clear
output voltage overshoots and a fall time of 2 ns at VDD=1.0
V.},
cin = {PGI-8-PT / PGI-9},
ddc = {620},
cid = {I:(DE-Juel1)PGI-8-PT-20110228 / I:(DE-Juel1)PGI-9-20110106},
pnm = {423 - Sensorics and bioinspired systems (POF2-423)},
pid = {G:(DE-HGF)POF2-423},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000319460800032},
doi = {10.1109/LED.2013.2258652},
url = {https://juser.fz-juelich.de/record/202365},
}