Home > Publications database > Fine neurite patterns from photocrosslinking of cell-repellent benzophenone copolymer > print |
001 | 202367 | ||
005 | 20240619091143.0 | ||
024 | 7 | _ | |a 10.1016/j.jneumeth.2012.07.011 |2 doi |
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100 | 1 | _ | |a Baek, Nam Seob |0 P:(DE-HGF)0 |b 0 |
245 | _ | _ | |a Fine neurite patterns from photocrosslinking of cell-repellent benzophenone copolymer |
260 | _ | _ | |a Amsterdam [u.a.] |c 2012 |b Elsevier Science |
336 | 7 | _ | |a Journal Article |b journal |m journal |0 PUB:(DE-HGF)16 |s 1435746490_745 |2 PUB:(DE-HGF) |
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520 | _ | _ | |a We have synthesized photocrosslinkable benzophenone copolymer, Poly(St-co-MBz), and fabricated cell-repellent patterns of Poly(St-co-MBz) on covalently bound poly-d-lysine (PDL) layer via the photocrosslinking. We have successfully obtained fine grid line pattern with line width of 3 μm and fine neurite, presumably axon, patterns with excellent pattern fidelity. We found that benzophenone unit can be crosslinked under the exposure of UV (with the intensity of ∼77 mW/cm2 at 280 nm and ∼60 mW/cm2 at 365 nm) without photo-oxidative damage to PDL, poly-l-lysine, and polyethyleneimine. |
536 | _ | _ | |a 453 - Physics of the Cell (POF2-453) |0 G:(DE-HGF)POF2-453 |c POF2-453 |f POF II |x 0 |
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700 | 1 | _ | |a Kim, Yong Hee |0 P:(DE-HGF)0 |b 1 |
700 | 1 | _ | |a Han, Young Hwan |0 P:(DE-HGF)0 |b 2 |
700 | 1 | _ | |a Offenhäusser, Andreas |0 P:(DE-Juel1)128713 |b 3 |
700 | 1 | _ | |a Chung, Myung-Ae |0 P:(DE-HGF)0 |b 4 |e Corresponding Author |
700 | 1 | _ | |a Jung, Sang-Don |0 P:(DE-HGF)0 |b 5 |
773 | _ | _ | |a 10.1016/j.jneumeth.2012.07.011 |g Vol. 210, no. 2, p. 161 - 168 |0 PERI:(DE-600)1500499-5 |n 2 |p 161 - 168 |t Journal of neuroscience methods |v 210 |y 2012 |x 0165-0270 |
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