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100 1 _ |a Baek, Nam Seob
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245 _ _ |a Fine neurite patterns from photocrosslinking of cell-repellent benzophenone copolymer
260 _ _ |a Amsterdam [u.a.]
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520 _ _ |a We have synthesized photocrosslinkable benzophenone copolymer, Poly(St-co-MBz), and fabricated cell-repellent patterns of Poly(St-co-MBz) on covalently bound poly-d-lysine (PDL) layer via the photocrosslinking. We have successfully obtained fine grid line pattern with line width of 3 μm and fine neurite, presumably axon, patterns with excellent pattern fidelity. We found that benzophenone unit can be crosslinked under the exposure of UV (with the intensity of ∼77 mW/cm2 at 280 nm and ∼60 mW/cm2 at 365 nm) without photo-oxidative damage to PDL, poly-l-lysine, and polyethyleneimine.
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700 1 _ |a Kim, Yong Hee
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700 1 _ |a Han, Young Hwan
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700 1 _ |a Offenhäusser, Andreas
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700 1 _ |a Chung, Myung-Ae
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700 1 _ |a Jung, Sang-Don
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773 _ _ |a 10.1016/j.jneumeth.2012.07.011
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