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@ARTICLE{SchulteBraucks:202953,
author = {Schulte-Braucks, C. and Stange, D. and von den Driesch, N.
and Blaeser, S. and Ikonic, Z. and Hartmann, J. M. and
Mantl, S. and Buca, D.},
title = {{N}egative differential resistance in direct bandgap
{G}e{S}n p-i-n structures},
journal = {Applied physics letters},
volume = {107},
number = {4},
issn = {1077-3118},
address = {Melville, NY},
publisher = {American Inst. of Physics},
reportid = {FZJ-2015-05073},
pages = {042101},
year = {2015},
abstract = {Certain GeSn alloys are group IV direct bandgap
semiconductors with prospects for electrical and
optoelectronical applications. In this letter, we report on
the temperature dependence of the electrical characteristics
of high Sn-content Ge0.89Sn0.11 p-i-n diodes. NiGeSn
contacts were used to minimize the access resistance and
ensure compatibility with silicon technology. The major
emphasis is placed on the negative differential resistance
in which peak to valley current ratios up to 2.3 were
obtained. TCAD simulations were performed to identify the
origin of the various current contributions, providing
evidence for direct band to band tunneling and trap assisted
tunneling.},
cin = {PGI-9 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521) / E2SWITCH - Energy Efficient Tunnel FET Switches
and Circuits (619509)},
pid = {G:(DE-HGF)POF3-521 / G:(EU-Grant)619509},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000358924200036},
doi = {10.1063/1.4927622},
url = {https://juser.fz-juelich.de/record/202953},
}