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@ARTICLE{Hospach:21056,
author = {Hospach, A. and Mauer, G. and Vaßen, R. and Stöver, D.},
title = {{C}haracteristics of {C}eramic {C}oatings {M}ade by {T}hin
{F}ilm {L}ow {P}ressure {P}lasma {S}praying ({LPPS}-{TF})},
journal = {Journal of thermal spray technology},
volume = {21},
number = {3-4},
issn = {1059-9630},
address = {Boston, Mass.},
publisher = {Springer},
reportid = {PreJuSER-21056},
pages = {435-440},
year = {2012},
note = {Record converted from VDB: 12.11.2012},
abstract = {The thin film low pressure plasma spray process (LPPS-TF)
has been developed with the aim of efficient depositing
uniform and thin coatings with large area coverage by plasma
spraying. At high power input (similar to 150 kW) and very
low pressure (similar to 100 Pa) the plasma jet properties
change considerably and it is even possible to evaporate the
powder feedstock material providing advanced microstructures
of the deposits. This relatively new technique bridges the
gap between conventional plasma spraying and physical vapor
deposition. In addition, the resulting microstructures are
unique and can hardly be obtained by other processes. In
this paper, microstructures made by LPPS-TF are shown and
the columnar layer growth by vapor deposition is
demonstrated. In addition to the ceramic materials TiO2,
Al2O3 or MgAl2O4, the focus of the research was placed on
partially yttria-stabilized zirconia. Variations of the
microstructures are shown and discussed concerning potential
coating applications.},
keywords = {J (WoSType)},
cin = {IEK-1},
ddc = {670},
cid = {I:(DE-Juel1)IEK-1-20101013},
pnm = {Rationelle Energieumwandlung},
pid = {G:(DE-Juel1)FUEK402},
shelfmark = {Materials Science, Coatings $\&$ Films},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000303472800010},
doi = {10.1007/s11666-012-9748-z},
url = {https://juser.fz-juelich.de/record/21056},
}