Hauptseite > Publikationsdatenbank > Anisotropy of strain relaxation in (100) and (110) Si/SiGe heterostructures > print

001     21115
005     20240610121245.0
024 7 _ |a 10.1063/1.3672447
|2 DOI
024 7 _ |a WOS:000299127200116
|2 WOS
024 7 _ |a 2128/7463
|2 Handle
037 _ _ |a PreJuSER-21115
041 _ _ |a eng
082 _ _ |a 530
084 _ _ |2 WoS
|a Physics, Applied
100 1 _ |a Trinkaus, H.
|0 P:(DE-Juel1)VDB3163
|b 0
|u FZJ
245 _ _ |a Anisotropy of strain relaxation in (100) and (110) Si/SiGe heterostructures
260 _ _ |a Melville, NY
|b American Institute of Physics
|c 2012
300 _ _ |a 014904
336 7 _ |a Journal Article
|0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
|0 0
|2 EndNote
336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a article
|2 DRIVER
440 _ 0 |a Journal of Applied Physics
|x 0021-8979
|0 3051
|y 1
|v 111
500 _ _ |3 POF3_Assignment on 2016-02-29
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a Plastic strain relaxation of SiGe layers of different crystal orientations is analytically analyzed and compared with experimental results. First, strain relaxation induced by ion implantation and annealing, considering dislocation loop punching and loop interactions with interfaces/surfaces is discussed. A flexible curved dislocation model is used to determine the relation of critical layer thickness with strain/stress. Specific critical conditions to be fulfilled, at both the start and end of the relaxation, are discussed by introducing a quality parameter for efficient strain relaxation, defined as the ratio of real to ideal critical thickness versus strain/stress. The anisotropy of the resolved shear stress is discussed for (001) and (011) crystal orientations in comparison with the experimentally observed anisotropy of strain relaxation for Si/SiGe heterostructures. (C) 2012 American Institute of Physics. [doi: 10.1063/1.3672447]
536 _ _ |a Grundlagen für zukünftige Informationstechnologien
|c P42
|2 G:(DE-HGF)
|0 G:(DE-Juel1)FUEK412
|x 0
588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
|2 WoSType
700 1 _ |a Buca, D.
|0 P:(DE-Juel1)125569
|b 1
|u FZJ
700 1 _ |a Minamisawa, R.A.
|0 P:(DE-Juel1)VDB98556
|b 2
|u FZJ
700 1 _ |a Holländer, B.
|0 P:(DE-Juel1)125595
|b 3
|u FZJ
700 1 _ |a Luysberg, M.
|0 P:(DE-Juel1)130811
|b 4
|u FZJ
700 1 _ |a Mantl, S.
|0 P:(DE-Juel1)VDB4959
|b 5
|u FZJ
773 _ _ |a 10.1063/1.3672447
|g Vol. 111, p. 014904
|p 014904
|q 111<014904
|0 PERI:(DE-600)1476463-5
|t Journal of applied physics
|v 111
|y 2012
|x 0021-8979
856 7 _ |u http://dx.doi.org/10.1063/1.3672447
856 4 _ |u https://juser.fz-juelich.de/record/21115/files/FZJ-21115.pdf
|y Published under German "Allianz" Licensing conditions on 2012-01-05. Available in OpenAccess from 2012-01-05
|z Published final document.
856 4 _ |u https://juser.fz-juelich.de/record/21115/files/FZJ-21115.jpg?subformat=icon-1440
|x icon-1440
856 4 _ |u https://juser.fz-juelich.de/record/21115/files/FZJ-21115.jpg?subformat=icon-180
|x icon-180
856 4 _ |u https://juser.fz-juelich.de/record/21115/files/FZJ-21115.jpg?subformat=icon-640
|x icon-640
909 C O |o oai:juser.fz-juelich.de:21115
|p openaire
|p open_access
|p driver
|p VDB
|p dnbdelivery
913 1 _ |b Schlüsseltechnologien
|k P42
|l Grundlagen für zukünftige Informationstechnologien (FIT)
|1 G:(DE-HGF)POF2-420
|0 G:(DE-Juel1)FUEK412
|2 G:(DE-HGF)POF2-400
|v Grundlagen für zukünftige Informationstechnologien
|x 0
913 2 _ |a DE-HGF
|b Key Technologies
|l Future Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)
|1 G:(DE-HGF)POF3-520
|0 G:(DE-HGF)POF3-529H
|2 G:(DE-HGF)POF3-500
|v Addenda
|x 0
914 1 _ |y 2012
915 _ _ |a JCR/ISI refereed
|0 StatID:(DE-HGF)0010
|2 StatID
915 _ _ |a JCR
|0 StatID:(DE-HGF)0100
|2 StatID
915 _ _ |a WoS
|0 StatID:(DE-HGF)0110
|2 StatID
|b Science Citation Index
915 _ _ |a WoS
|0 StatID:(DE-HGF)0111
|2 StatID
|b Science Citation Index Expanded
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0150
|2 StatID
|b Web of Science Core Collection
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0199
|2 StatID
|b Thomson Reuters Master Journal List
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0200
|2 StatID
|b SCOPUS
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)0300
|2 StatID
|b Medline
915 _ _ |a Allianz-Lizenz / DFG
|0 StatID:(DE-HGF)0400
|2 StatID
915 _ _ |a Nationallizenz
|0 StatID:(DE-HGF)0420
|2 StatID
915 _ _ |a OpenAccess
|0 StatID:(DE-HGF)0510
|2 StatID
915 _ _ |a Allianz-OA
|0 StatID:(DE-HGF)0520
|2 StatID
915 _ _ |a DBCoverage
|0 StatID:(DE-HGF)1020
|2 StatID
|b Current Contents - Social and Behavioral Sciences
920 1 _ |0 I:(DE-82)080009_20140620
|k JARA-FIT
|l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology
|g JARA
|x 1
920 1 _ |0 I:(DE-Juel1)PGI-9-20110106
|k PGI-9
|l Halbleiter-Nanoelektronik
|g PGI
|x 0
920 1 _ |0 I:(DE-Juel1)PGI-5-20110106
|k PGI-5
|l Mikrostrukturforschung
|g PGI
|x 2
970 _ _ |a VDB:(DE-Juel1)136949
980 1 _ |a FullTexts
980 _ _ |a VDB
980 _ _ |a ConvertedRecord
980 _ _ |a journal
980 _ _ |a I:(DE-82)080009_20140620
980 _ _ |a I:(DE-Juel1)PGI-9-20110106
980 _ _ |a I:(DE-Juel1)PGI-5-20110106
980 _ _ |a UNRESTRICTED
980 _ _ |a JUWEL
980 _ _ |a FullTexts
981 _ _ |a I:(DE-Juel1)ER-C-1-20170209
981 _ _ |a I:(DE-Juel1)PGI-9-20110106
981 _ _ |a I:(DE-Juel1)PGI-5-20110106
981 _ _ |a I:(DE-Juel1)VDB881

LibraryCollectionCLSMajorCLSMinorLanguageAuthor
Marc 21