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| Home > Publications database > Characterization of Lanthanum Lutetium oxide high k / metal gate stacks for CMOS process integration > print |
| 001 | 21119 | ||
| 005 | 20180208230726.0 | ||
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| 100 | 1 | _ | |a Nichau, A. |b 0 |u FZJ |0 P:(DE-Juel1)VDB88502 |
| 111 | 2 | _ | |c Madrid |d 2012-04-16 |
| 245 | _ | _ | |a Characterization of Lanthanum Lutetium oxide high k / metal gate stacks for CMOS process integration |
| 260 | _ | _ | |c 2012 |
| 295 | 1 | 0 | |a SpLine Beamline Users' Meeting |
| 336 | 7 | _ | |a Conference Presentation |0 PUB:(DE-HGF)6 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Conference Paper |0 33 |2 EndNote |
| 336 | 7 | _ | |a Other |2 DataCite |
| 336 | 7 | _ | |a LECTURE_SPEECH |2 ORCID |
| 336 | 7 | _ | |a conferenceObject |2 DRIVER |
| 336 | 7 | _ | |a INPROCEEDINGS |2 BibTeX |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 500 | _ | _ | |3 Presentation on a conference |
| 536 | _ | _ | |a Grundlagen für zukünftige Informationstechnologien |c P42 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK412 |x 0 |
| 700 | 1 | _ | |a Schubert, J. |b 1 |u FZJ |0 P:(DE-Juel1)128631 |
| 700 | 1 | _ | |a Rubio-Zuazo, J. |b 2 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Besmehn, A. |b 3 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Schnee, M. |b 4 |u FZJ |0 P:(DE-Juel1)VDB93168 |
| 700 | 1 | _ | |a Schäfer, A. |b 5 |u FZJ |0 P:(DE-Juel1)144017 |
| 700 | 1 | _ | |a Castro, G. |b 6 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Mantl, S. |b 7 |u FZJ |0 P:(DE-Juel1)VDB4959 |
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| 914 | 1 | _ | |y 2012 |
| 920 | 1 | _ | |0 I:(DE-Juel1)PGI-9-20110106 |k PGI-9 |l Halbleiter-Nanoelektronik |g PGI |x 0 |
| 920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology |g JARA |x 1 |
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