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Oxide-based ReRAM - Ultrafast switching, mechanism, and prospect
Menzel, S.FZJ* ; Waser, R.FZJ*
2011
2011International Symposium on Advanced Gate Stack Technology, SEMATECH
Seminar, Bolton Landing, NY, USABolton Landing, NY, USA, 19 Oct 20112011-10-19
Note: Record converted from VDB: 12.11.2012
Contributing Institute(s):
- Elektronische Materialien (PGI-7)
- Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
- Grundlagen für zukünftige Informationstechnologien (P42)
Appears in the scientific report
2011