Home > Publications database > Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration > EndNote Text |
%0 Conference Paper %A Nichau, A. %A Schubert, J. %A Rubio-Zuazo, J. %A Besmehn, A. %A Schnee, M. %A Schäfer, A. %A Castro, G.R. %A Mantl, S. %T Characterization of Lanthanum Lutetium oxide high-k / metal gate stacks for CMOS process integration %M PreJuSER-23341 %D 2012 %Z Record converted from VDB: 12.11.2012 %< SpLine Users' Meeting Y2 16 Apr 2012 M2 Madrid, Spanien, %F PUB:(DE-HGF)24 %9 Poster %U https://juser.fz-juelich.de/record/23341