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000025274 084__ $$2WoS$$aChemistry, Physical
000025274 084__ $$2WoS$$aMaterials Science, Coatings & Films
000025274 084__ $$2WoS$$aPhysics, Applied
000025274 084__ $$2WoS$$aPhysics, Condensed Matter
000025274 1001_ $$0P:(DE-Juel1)VDB5526$$aJeliazova, Y.$$b0$$uFZJ
000025274 245__ $$aThe growth of ultrathin Al2O3 films on Cu(111)
000025274 260__ $$aAmsterdam$$bNorth-Holland$$c2002
000025274 300__ $$a51 - 59
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000025274 440_0 $$0573$$aApplied Surface Science$$v187$$x0169-4332
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000025274 520__ $$aThe growth of ultrathin films of Al2O3 on Cu(111) in the temperature range 300-1200 K was investigated by using Auger electron spectroscopy (AES), low-energy electron diffraction (LEED) and high-resolution electron energy loss spectroscopy (HREELS). Eight monolayers of a mixture of nickel and aluminum (Ni:Al = 1:2) were deposited on Cu(l 1 1) at 300 K by simultaneous evaporation of both Ni and Al from NiAl crystal material. The bimetal layer was oxidized at 300 K until saturation and annealed gradually to 1200 K. During oxygen adsorption, only aluminum is oxidized. Annealing of the oxidized layer to 1200 K leads to the formation of a well-ordered aluminum oxide. The HREEL spectra show the characteristic Fuchs-Kliever phonons of Al2O3 (410, 620 and 885 cm(-1)). During annealing, Ni diffuses into the Cu(I 1 1) substrate. The LEED pattern of the ultrathin oxide layer has a hexagonal structure with a lattice constant of 3.1 Angstrom, which corresponds to the distance between two oxygen ions in the aluminum oxide. (C) 2002 Elsevier Science B.V. All rights reserved.
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000025274 65320 $$2Author$$aaluminum oxide
000025274 65320 $$2Author$$aAuger electron spectroscopy
000025274 65320 $$2Author$$alow-energy electron diffraction
000025274 65320 $$2Author$$ahigh-resolution electron energy loss spectroscopy
000025274 65320 $$2Author$$acopper
000025274 65320 $$2Author$$asurface structure
000025274 65320 $$2Author$$aoxidation
000025274 7001_ $$0P:(DE-Juel1)VDB5400$$aFranchy, R.$$b1$$uFZJ
000025274 773__ $$0PERI:(DE-600)2002520-8$$a10.1016/S0169-4332(01)00773-5$$gVol. 187, p. 51 - 59$$p51 - 59$$q187<51 - 59$$tApplied surface science$$v187$$x0169-4332$$y2002
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000025274 9141_ $$y2002
000025274 915__ $$0StatID:(DE-HGF)0010$$aJCR/ISI refereed
000025274 9201_ $$0I:(DE-Juel1)VDB43$$d31.12.2006$$gISG$$kISG-3$$lInstitut für Grenzflächen und Vakuumtechnologien$$x0
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