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| Hauptseite > Publikationsdatenbank > The growth of ultrathin Al2O3 films on Cu(111) > print |
| 001 | 25274 | ||
| 005 | 20180210141755.0 | ||
| 024 | 7 | _ | |2 DOI |a 10.1016/S0169-4332(01)00773-5 |
| 024 | 7 | _ | |2 WOS |a WOS:000175089200006 |
| 037 | _ | _ | |a PreJuSER-25274 |
| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 670 |
| 084 | _ | _ | |2 WoS |a Chemistry, Physical |
| 084 | _ | _ | |2 WoS |a Materials Science, Coatings & Films |
| 084 | _ | _ | |2 WoS |a Physics, Applied |
| 084 | _ | _ | |2 WoS |a Physics, Condensed Matter |
| 100 | 1 | _ | |a Jeliazova, Y. |b 0 |u FZJ |0 P:(DE-Juel1)VDB5526 |
| 245 | _ | _ | |a The growth of ultrathin Al2O3 films on Cu(111) |
| 260 | _ | _ | |a Amsterdam |b North-Holland |c 2002 |
| 300 | _ | _ | |a 51 - 59 |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Applied Surface Science |x 0169-4332 |0 573 |v 187 |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 520 | _ | _ | |a The growth of ultrathin films of Al2O3 on Cu(111) in the temperature range 300-1200 K was investigated by using Auger electron spectroscopy (AES), low-energy electron diffraction (LEED) and high-resolution electron energy loss spectroscopy (HREELS). Eight monolayers of a mixture of nickel and aluminum (Ni:Al = 1:2) were deposited on Cu(l 1 1) at 300 K by simultaneous evaporation of both Ni and Al from NiAl crystal material. The bimetal layer was oxidized at 300 K until saturation and annealed gradually to 1200 K. During oxygen adsorption, only aluminum is oxidized. Annealing of the oxidized layer to 1200 K leads to the formation of a well-ordered aluminum oxide. The HREEL spectra show the characteristic Fuchs-Kliever phonons of Al2O3 (410, 620 and 885 cm(-1)). During annealing, Ni diffuses into the Cu(I 1 1) substrate. The LEED pattern of the ultrathin oxide layer has a hexagonal structure with a lattice constant of 3.1 Angstrom, which corresponds to the distance between two oxygen ions in the aluminum oxide. (C) 2002 Elsevier Science B.V. All rights reserved. |
| 536 | _ | _ | |a Kondensierte Materie |c M02 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK242 |x 0 |
| 588 | _ | _ | |a Dataset connected to Web of Science |
| 650 | _ | 7 | |a J |2 WoSType |
| 653 | 2 | 0 | |2 Author |a aluminum oxide |
| 653 | 2 | 0 | |2 Author |a Auger electron spectroscopy |
| 653 | 2 | 0 | |2 Author |a low-energy electron diffraction |
| 653 | 2 | 0 | |2 Author |a high-resolution electron energy loss spectroscopy |
| 653 | 2 | 0 | |2 Author |a copper |
| 653 | 2 | 0 | |2 Author |a surface structure |
| 653 | 2 | 0 | |2 Author |a oxidation |
| 700 | 1 | _ | |a Franchy, R. |b 1 |u FZJ |0 P:(DE-Juel1)VDB5400 |
| 773 | _ | _ | |a 10.1016/S0169-4332(01)00773-5 |g Vol. 187, p. 51 - 59 |p 51 - 59 |q 187<51 - 59 |0 PERI:(DE-600)2002520-8 |t Applied surface science |v 187 |y 2002 |x 0169-4332 |
| 909 | C | O | |o oai:juser.fz-juelich.de:25274 |p VDB |
| 913 | 1 | _ | |k M02 |v Kondensierte Materie |l Kondensierte Materie |b Materie |0 G:(DE-Juel1)FUEK242 |x 0 |
| 914 | 1 | _ | |y 2002 |
| 915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
| 920 | 1 | _ | |k ISG-3 |l Institut für Grenzflächen und Vakuumtechnologien |d 31.12.2006 |g ISG |0 I:(DE-Juel1)VDB43 |x 0 |
| 970 | _ | _ | |a VDB:(DE-Juel1)16476 |
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| 980 | _ | _ | |a UNRESTRICTED |
| 981 | _ | _ | |a I:(DE-Juel1)PGI-3-20110106 |
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