TY  - JOUR
AU  - Paik, Hanjong
AU  - Moyer, Jarrett A.
AU  - Spila, Timothy
AU  - Tashman, Joshua W.
AU  - Mundy, Julia A.
AU  - Freeman, Eugene
AU  - Shukla, Nikhil
AU  - Lapano, Jason M.
AU  - Engel-Herbert, Roman
AU  - Zander, Willi
AU  - Schubert, Jürgen
AU  - Muller, David A.
AU  - Datta, Suman
AU  - Schiffer, Peter
AU  - Schlom, Darrell G.
TI  - Transport properties of ultra-thin VO2 films on (001) TiO2 grown by reactive molecular-beam epitaxy
JO  - Applied physics letters
VL  - 107
IS  - 16
SN  - 1077-3118
CY  - Melville, NY
PB  - American Inst. of Physics
M1  - FZJ-2015-06199
SP  - 163101 -
PY  - 2015
AB  - We report the growth of (001)-oriented VO2 films as thin as 1.5 nm with abrupt and reproduciblemetal-insulator transitions (MIT) without a capping layer. Limitations to the growth of thinnerfilms with sharp MITs are discussed, including the Volmer-Weber type growth mode due to thehigh energy of the (001) VO2 surface. Another key limitation is interdiffusion with the (001) TiO2substrate, which we quantify using low angle annular dark field scanning transmission electronmicroscopy in conjunction with electron energy loss spectroscopy. We find that controlling islandcoalescence on the (001) surface and minimization of cation interdiffusion by using a low growthtemperature followed by a brief anneal at higher temperature are crucial for realizing ultrathin VO2films with abrupt MIT behavior. VC 2015 AIP Publishing LLC.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000363781900023
DO  - DOI:10.1063/1.4932123
UR  - https://juser.fz-juelich.de/record/256223
ER  -