000276354 001__ 276354
000276354 005__ 20210129220849.0
000276354 0247_ $$2doi$$a10.1016/j.apsusc.2015.10.072
000276354 0247_ $$2ISSN$$a0169-4332
000276354 0247_ $$2ISSN$$a1873-5584
000276354 0247_ $$2WOS$$aWOS:000366220600011
000276354 037__ $$aFZJ-2015-06814
000276354 041__ $$aEnglish
000276354 082__ $$a670
000276354 1001_ $$0P:(DE-Juel1)156312$$aXu, Chengcheng$$b0$$eCorresponding author$$ufzj
000276354 245__ $$aImpact of cation stoichiometry on the early stage of growth of SrTiO3 deposited by pulsed laser deposition
000276354 260__ $$aAmsterdam$$bElsevier$$c2015
000276354 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1448526897_24256
000276354 3367_ $$2DataCite$$aOutput Types/Journal article
000276354 3367_ $$00$$2EndNote$$aJournal Article
000276354 3367_ $$2BibTeX$$aARTICLE
000276354 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000276354 3367_ $$2DRIVER$$aarticle
000276354 520__ $$aBy performing in situ growth studies during pulsed laser deposition, we observed a strong reduction of the surface diffusion coefficients for slightly non-stoichiometric SrTiO3. Both, stoichiometric and non-stoichiometric thin films exhibit 2D layer by layer growth. However, in the non-stoichiometric case the 2D island coalescence is significantly delayed, which goes along with a shift of the reflection high electron energy diffraction (RHEED) minimum. We could explain this shift of the RHEED minimum by developing a model for the step density evolution taking into account finite surface diffusion.
000276354 536__ $$0G:(DE-HGF)POF3-521$$a521 - Controlling Electron Charge-Based Phenomena (POF3-521)$$cPOF3-521$$fPOF III$$x0
000276354 588__ $$aDataset connected to CrossRef
000276354 7001_ $$0P:(DE-Juel1)145323$$aMoors, Marco$$b1
000276354 7001_ $$0P:(DE-Juel1)130620$$aDittmann, Regina$$b2
000276354 773__ $$0PERI:(DE-600)2002520-8$$a10.1016/j.apsusc.2015.10.072$$gVol. 359, p. 68 - 72$$p68 - 72$$tApplied surface science$$v359$$x0169-4332$$y2015
000276354 8564_ $$uhttps://juser.fz-juelich.de/record/276354/files/1-s2.0-S0169433215024915-main.pdf$$yRestricted
000276354 8564_ $$uhttps://juser.fz-juelich.de/record/276354/files/1-s2.0-S0169433215024915-main.gif?subformat=icon$$xicon$$yRestricted
000276354 8564_ $$uhttps://juser.fz-juelich.de/record/276354/files/1-s2.0-S0169433215024915-main.jpg?subformat=icon-1440$$xicon-1440$$yRestricted
000276354 8564_ $$uhttps://juser.fz-juelich.de/record/276354/files/1-s2.0-S0169433215024915-main.jpg?subformat=icon-180$$xicon-180$$yRestricted
000276354 8564_ $$uhttps://juser.fz-juelich.de/record/276354/files/1-s2.0-S0169433215024915-main.jpg?subformat=icon-640$$xicon-640$$yRestricted
000276354 8564_ $$uhttps://juser.fz-juelich.de/record/276354/files/1-s2.0-S0169433215024915-main.pdf?subformat=pdfa$$xpdfa$$yRestricted
000276354 909CO $$ooai:juser.fz-juelich.de:276354$$pVDB
000276354 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)156312$$aForschungszentrum Jülich GmbH$$b0$$kFZJ
000276354 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)145323$$aForschungszentrum Jülich GmbH$$b1$$kFZJ
000276354 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130620$$aForschungszentrum Jülich GmbH$$b2$$kFZJ
000276354 9131_ $$0G:(DE-HGF)POF3-521$$1G:(DE-HGF)POF3-520$$2G:(DE-HGF)POF3-500$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bKey Technologies$$lFuture Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)$$vControlling Electron Charge-Based Phenomena$$x0
000276354 9141_ $$y2015
000276354 915__ $$0StatID:(DE-HGF)0420$$2StatID$$aNationallizenz
000276354 915__ $$0StatID:(DE-HGF)0100$$2StatID$$aJCR$$bAPPL SURF SCI : 2014
000276354 915__ $$0StatID:(DE-HGF)0200$$2StatID$$aDBCoverage$$bSCOPUS
000276354 915__ $$0StatID:(DE-HGF)0300$$2StatID$$aDBCoverage$$bMedline
000276354 915__ $$0StatID:(DE-HGF)0199$$2StatID$$aDBCoverage$$bThomson Reuters Master Journal List
000276354 915__ $$0StatID:(DE-HGF)0110$$2StatID$$aWoS$$bScience Citation Index
000276354 915__ $$0StatID:(DE-HGF)0150$$2StatID$$aDBCoverage$$bWeb of Science Core Collection
000276354 915__ $$0StatID:(DE-HGF)0111$$2StatID$$aWoS$$bScience Citation Index Expanded
000276354 915__ $$0StatID:(DE-HGF)1150$$2StatID$$aDBCoverage$$bCurrent Contents - Physical, Chemical and Earth Sciences
000276354 915__ $$0StatID:(DE-HGF)1160$$2StatID$$aDBCoverage$$bCurrent Contents - Engineering, Computing and Technology
000276354 915__ $$0StatID:(DE-HGF)9900$$2StatID$$aIF < 5
000276354 9201_ $$0I:(DE-Juel1)PGI-7-20110106$$kPGI-7$$lElektronische Materialien$$x0
000276354 980__ $$ajournal
000276354 980__ $$aVDB
000276354 980__ $$aI:(DE-Juel1)PGI-7-20110106
000276354 980__ $$aUNRESTRICTED