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@INPROCEEDINGS{Schuck:280538,
author = {Schuck, Martin and Riess, Sally and Bornhöfft, Manuel and
Du, Hongchu and Mayer, Joachim and Mussler, Gregor and von
der Ahe, Martina and Hardtdegen, Hilde and Grützmacher,
Detlev},
title = {{D}eposition of monocrystalline trigonal ${G}e_x$ ${S}b_y$
${T}e_z$ by {M}etal {O}rganic {V}apour {P}hase {E}pitaxy},
school = {RWTH Aachen},
reportid = {FZJ-2016-00306},
year = {2015},
abstract = {Phase change memory (PCM) based on chalcogenides such as
the Ge-Sb-Te compounds along the Sb2Te3 – GeTe
pseudo-binary line have been widely used for optical data
storage and in recent years also as nonvolatile resistive
memory devices. In these applications, the ultra-fast and
reversible phase change between the amorphous and the
metastable cubic crystalline phase, associated with a high
contrast in reflectivity and resistivity is used for data
storage. They are deposited in the amorphous state by atomic
layer deposition or physical vapour deposition (sputtering).
Due to the lack of applications, the thermodynamically
stable crystalline hexagonal phase wasnot in the centre of
attention up to now. However, recently superlattices of
highly textured hexagonal Sb2Te3 – GeTe layers have
received increasing interest due to an altered switching
mechanism with reduced switching energy.Switching is field
induced and occurs at the interfaces of the materials
between two crystalline states circumventing melting for the
phase change. The layered structure of monocrystalline
hexagonal Ge-Sb-Te inherently resembles the superlattice
structure with respect to atomic stacking and crystal
orientation to the substrate. For this reason, the
preparation and intense study of epitaxial, hexagonal
Ge-Sb-Te can be of fundamental interest for future
applications. In this contribution, we present the growth
and characterization of crystalline Ge-Sb-Te films on Si
(111) deposited by MOVPE. At a reactor pressure of 50 hPa
and growth temperatures around 450°C epitaxial films are
grown using nitrogen as the carrier gas to transport the
precursors DETe, TESb and digermane to the reactor.
Different partial pressures of the precursors were employed
to vary the film composition. The morphology of the
deposited material was investigated using AFM and SEM, while
the structure of the as-grown samples was studied by XPS,
XRD and TEM. The chemical composition was determined using
EDS.The two compositions Ge1Sb2Te4 and Ge2Sb2Te5 were
controllably achieved. XRD studies indicate, that the 100nm
thick Ge-Sb-Te is crystallized in the stable hexagonal
structure (P-3m1 or R-3m). TEM investigations reveal that
the Ge, Sb and Te atoms form building blocks, consisting of
7 (Ge1Sb2Te4) or 9 (Ge2Sb2Te5) alternating cation and anion
layers in parallel to the Si (111) substrate surface,
stacked along the [0001] axis. These building blocks are
separated by van der Waals gaps originating from hexagonal
Sb2Te3, where they are naturally present. The samples are
monocrystalline and exhibit a low amount of defects. XPS
reveals oxidation mainly of Ge and Sb at the surface of the
films. Additionally the occupation of the cation sites by Ge
and Sb atoms in the hexagonal lattice was investigated by
TEM and XPS.},
month = {Nov},
date = {2015-11-29},
organization = {2015 MRS Fall Meeting $\&$ Exhibit,
Boston, MA (USA), 29 Nov 2015 - 4 Dec
2015},
cin = {PGI-9 / PGI-5},
cid = {I:(DE-Juel1)PGI-9-20110106 / I:(DE-Juel1)PGI-5-20110106},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521) / SYNAPSE - SYnthesis and functionality of
chalcogenide NAnostructures for PhaSE change memories
(310339)},
pid = {G:(DE-HGF)POF3-521 / G:(EU-Grant)310339},
typ = {PUB:(DE-HGF)24},
url = {https://juser.fz-juelich.de/record/280538},
}