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@ARTICLE{Bartolom:280562,
      author       = {Bartolomé, J. and Badía-Romano, L. and Rubín, J. and
                      Bartolomé, F. and Varnakov, S. N. and Ovchinnikov, S. G.
                      and Bürgler, Daniel},
      title        = {{M}agnetic properties, morphology and interfaces of
                      ({F}e/{S}i)n nanostructures},
      journal      = {Journal of magnetism and magnetic materials},
      volume       = {400},
      issn         = {0304-8853},
      address      = {Amsterdam},
      publisher    = {North-Holland Publ. Co.},
      reportid     = {FZJ-2016-00330},
      pages        = {271 - 275},
      year         = {2016},
      abstract     = {A systematic study of the iron–silicon interfaces formed
                      upon preparation of (Fe/Si) multilayers has been performed
                      by the combination of modern and powerful techniques.
                      Samples were prepared by molecular beam epitaxy under
                      ultrahigh vacuum onto Si wafers or single crystalline
                      Ag(100) buffer layers grown on GaAs(100). The morphology of
                      these films and their interfaces was studied by a
                      combination of scanning transmission electron microscopy,
                      X-ray reflectivity, angle resolved X-ray photoelectron
                      spectroscopy and hard X-ray photoelectron spectroscopy. The
                      Si-on-Fe interface thickness and roughness were determined
                      to be 1.4(1) nm and 0.6(1) nm, respectively. Moreover,
                      determination of the stable phases formed at both Fe-on-Si
                      and Si-on-Fe interfaces was performed using conversion
                      electron Mössbauer spectroscopy on multilayers with well
                      separated Si-on-Fe and Fe-on-Si interfaces. It is shown that
                      while a fraction of Fe remains as α-Fe, the rest has
                      reacted with Si, forming the paramagnetic FeSi phase and a
                      ferromagnetic Fe rich silicide. We conclude that there is an
                      identical paramagnetic c-Fe1−xSi silicide sublayer in both
                      Si-on-Fe and Fe-on-Si interfaces, whereas an asymmetry is
                      revealed in the composition of the ferromagnetic silicide
                      sublayer.},
      cin          = {PGI-6},
      ddc          = {530},
      cid          = {I:(DE-Juel1)PGI-6-20110106},
      pnm          = {522 - Controlling Spin-Based Phenomena (POF3-522)},
      pid          = {G:(DE-HGF)POF3-522},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000366157600055},
      doi          = {10.1016/j.jmmm.2015.07.046},
      url          = {https://juser.fz-juelich.de/record/280562},
}