000280955 001__ 280955
000280955 005__ 20210129221522.0
000280955 037__ $$aFZJ-2016-00666
000280955 041__ $$aEnglish
000280955 1001_ $$0P:(DE-Juel1)165704$$aHardtdegen, Alexander$$b0$$ufzj
000280955 1112_ $$aDPG Tagung$$cBerlin$$d2015-03-15 - 2015-03-20$$wGermany
000280955 245__ $$aResistive switching in HfO2 thin films grown by plasma-assisted ALD
000280955 260__ $$c2015
000280955 3367_ $$0PUB:(DE-HGF)24$$2PUB:(DE-HGF)$$aPoster$$bposter$$mposter$$s1453390682_2881
000280955 3367_ $$033$$2EndNote$$aConference Paper
000280955 3367_ $$2DataCite$$aOutput Types/Conference Poster
000280955 3367_ $$2DRIVER$$aconferenceObject
000280955 3367_ $$2ORCID$$aCONFERENCE_POSTER
000280955 3367_ $$2BibTeX$$aINPROCEEDINGS
000280955 536__ $$0G:(DE-HGF)POF3-524$$a524 - Controlling Collective States (POF3-524)$$cPOF3-524$$fPOF III$$x0
000280955 7001_ $$0P:(DE-Juel1)130717$$aHoffmann-Eifert, Susanne$$b1$$ufzj
000280955 909CO $$ooai:juser.fz-juelich.de:280955$$pVDB
000280955 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)165704$$aForschungszentrum Jülich GmbH$$b0$$kFZJ
000280955 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130717$$aForschungszentrum Jülich GmbH$$b1$$kFZJ
000280955 9131_ $$0G:(DE-HGF)POF3-524$$1G:(DE-HGF)POF3-520$$2G:(DE-HGF)POF3-500$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bKey Technologies$$lFuture Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)$$vControlling Collective States$$x0
000280955 9141_ $$y2015
000280955 915__ $$0StatID:(DE-HGF)0550$$2StatID$$aNo Authors Fulltext
000280955 9201_ $$0I:(DE-Juel1)PGI-7-20110106$$kPGI-7$$lElektronische Materialien$$x0
000280955 980__ $$aposter
000280955 980__ $$aVDB
000280955 980__ $$aUNRESTRICTED
000280955 980__ $$aI:(DE-Juel1)PGI-7-20110106