Hauptseite > Publikationsdatenbank > Resistive switching in HfO2 thin films grown by plasma-assisted ALD > print

001     280955
005     20210129221522.0
037 _ _ |a FZJ-2016-00666
041 _ _ |a English
100 1 _ |a Hardtdegen, Alexander
|0 P:(DE-Juel1)165704
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111 2 _ |a DPG Tagung
|c Berlin
|d 2015-03-15 - 2015-03-20
|w Germany
245 _ _ |a Resistive switching in HfO2 thin films grown by plasma-assisted ALD
260 _ _ |c 2015
336 7 _ |a Poster
|b poster
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336 7 _ |a Conference Paper
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336 7 _ |a Output Types/Conference Poster
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336 7 _ |a INPROCEEDINGS
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536 _ _ |a 524 - Controlling Collective States (POF3-524)
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|c POF3-524
|f POF III
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700 1 _ |a Hoffmann-Eifert, Susanne
|0 P:(DE-Juel1)130717
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909 C O |o oai:juser.fz-juelich.de:280955
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910 1 _ |a Forschungszentrum Jülich GmbH
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910 1 _ |a Forschungszentrum Jülich GmbH
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913 1 _ |a DE-HGF
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|v Controlling Collective States
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914 1 _ |y 2015
915 _ _ |a No Authors Fulltext
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920 1 _ |0 I:(DE-Juel1)PGI-7-20110106
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980 _ _ |a poster
980 _ _ |a VDB
980 _ _ |a UNRESTRICTED
980 _ _ |a I:(DE-Juel1)PGI-7-20110106

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