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@INPROCEEDINGS{Xu:281004,
author = {Xu, Chengcheng and Wicklein, Sebastian and Sambri, A. and
Amoruso, S. and Moors, Marco and Dittmann, Regina},
title = {{I}mpact of the non-stoichiometry on the initial growth
stage of {S}r{T}i{O}3 thin films},
reportid = {FZJ-2016-00715},
year = {2015},
month = {Oct},
date = {2015-10-07},
organization = {22nd Int. Workshop on Oxide
Electronics, Paris (France), 7 Oct 2015
- 9 Oct 2015},
subtyp = {Other},
cin = {PGI-7},
cid = {I:(DE-Juel1)PGI-7-20110106},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)6},
url = {https://juser.fz-juelich.de/record/281004},
}